http://www.cnr.it/ontology/cnr/individuo/prodotto/ID320904
Evolution of lateral ordering in symmetric block copolymer thin films upon rapid thermal processing (Articolo in rivista)
- Type
- Label
- Evolution of lateral ordering in symmetric block copolymer thin films upon rapid thermal processing (Articolo in rivista) (literal)
- Anno
- 2014-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1088/0957-4484/25/27/275601 (literal)
- Alternative label
Ceresoli, Monica; Lupi, Federico Ferrarese; Seguini, Gabriele; Sparnacci, Katia; Gianotti, Valentina; Antonioli, Diego; Laus, Michele; Boarino, Luca; Perego, Michele (2014)
Evolution of lateral ordering in symmetric block copolymer thin films upon rapid thermal processing
in Nanotechnology (Bristol. Print)
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Ceresoli, Monica; Lupi, Federico Ferrarese; Seguini, Gabriele; Sparnacci, Katia; Gianotti, Valentina; Antonioli, Diego; Laus, Michele; Boarino, Luca; Perego, Michele (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
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- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
- Note
- ISI Web of Science (WoS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- IMM CNR; University of Milan; University of Eastern Piedmont Amedeo Avogadro; Istituto Nazionale di Ricerca Metrologica (INRIM) (literal)
- Titolo
- Evolution of lateral ordering in symmetric block copolymer thin films upon rapid thermal processing (literal)
- Abstract
- This work reports experimental findings about the evolution of lateral ordering of lamellar microdomains in symmetric PS-b-PMMA thin films on featureless substrates. Phase separation and microdomain evolution are explored in a rather wide range of temperatures (190-340 degrees C) using a rapid thermal processing (RTP) system. The maximum processing temperature that enables the ordering of block copolymers without introducing any significant degradation of macromolecules is identified. The reported results clearly indicate that the range of accessible temperatures in the processing of these self-assembling materials is mainly limited by the thermal instability of the grafted random copolymer layer, which starts to degrade at T > 300 degrees C, inducing detachment of the block copolymer thin film. For T <= 290 degrees C, clear dependence of correlation length (xi) values on temperature is observed. The highest level of lateral order achievable in the current system in a quasi-equilibrium condition was obtained at the upper processing temperature limit after an annealing time as short as 60 s. (literal)
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