http://www.cnr.it/ontology/cnr/individuo/prodotto/ID311428
Generation and self-organization of bimetallic PdAu nanoparticles on SiO2 by sequential sputtering depositions and annealing processes (Articolo in rivista)
- Type
- Label
- Generation and self-organization of bimetallic PdAu nanoparticles on SiO2 by sequential sputtering depositions and annealing processes (Articolo in rivista) (literal)
- Anno
- 2012-01-01T00:00:00+01:00 (literal)
- Alternative label
F. Ruffino, E. F. Pecora, and M. G. Grimaldi (2012)
Generation and self-organization of bimetallic PdAu nanoparticles on SiO2 by sequential sputtering depositions and annealing processes
in Journal of nanoscience and nanotechnology (Print)
(literal)
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- F. Ruffino, E. F. Pecora, and M. G. Grimaldi (literal)
- Pagina inizio
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- Rivista
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- Dipartimento di Fisica e Astronomia and CNR-IMM MATIS, Università di Catania,
via S. Sofia 64, I-95123 Catania, Italy (literal)
- Titolo
- Generation and self-organization of bimetallic PdAu nanoparticles on SiO2 by sequential sputtering depositions and annealing processes (literal)
- Abstract
- PdAu nanoparticles have been grown on SiO2 by room-temperature sequential sputtering depositions.
The nucleation and growth kinetics have been determined crossing atomic force and scanning
electron microscopy measurements. From these measurements the mechanisms of the nucleation
and growth have been determined. In particular: (1) during the deposition of the first metal (Pd),
atoms adsorbed on the substrate are readily trapped on the substrate defects, forming stable nuclei
which grow further. During the deposition of the second metal (Au), adsorbed atoms are captured
by the clusters formed during the first deposition, before they have time to form a stable
nucleus of pure second metal on the surface sites. So, the nucleation is mainly controlled by the
Pd and the Au atoms are incorporated essentially by direct impingement of the vapour atoms on
the already formed particles. (2) fixing the amount of Pd and Au, during post-deposition thermal
treatments, a surface diffusion limited ripening of the NPs occurs. Applying the standard ripening
growth theory several parameters characterizing the process were determined, in particular,
the growth exponent n and the activation energy Ea. n was found to be dependent on temperature
and amount of Au deposited. Ea was found to linearly increase with the amount of Au
deposited. Such a dependence is discussed separating Ea in two terms: one describing the activation
energy for atomic surface diffusion (independent on the amount of Au deposited), the other
one describing the activation energy for the film clustering process (dependent on the amount of
Au deposited). (literal)
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