Electrical characterization and Auger depth profiling of nanogap electrodes fabricated by I-2-assisted focused ion beam (Articolo in rivista)

Type
Label
  • Electrical characterization and Auger depth profiling of nanogap electrodes fabricated by I-2-assisted focused ion beam (Articolo in rivista) (literal)
Anno
  • 2006-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1063/1.2364833 (literal)
Alternative label
  • Gazzadi, GC; Angeli, E; Facci, P; Frabboni, S (2006)
    Electrical characterization and Auger depth profiling of nanogap electrodes fabricated by I-2-assisted focused ion beam
    in Applied physics letters
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Gazzadi, GC; Angeli, E; Facci, P; Frabboni, S (literal)
Pagina inizio
  • 173112 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 89 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 3 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 17 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • INFM, CNR, I-41100 Modena, Italy; Univ Modena & Reggio Emilia, Dipartimento Fis, I-41100 Modena, Italy (literal)
Titolo
  • Electrical characterization and Auger depth profiling of nanogap electrodes fabricated by I-2-assisted focused ion beam (literal)
Abstract
  • Iodine (I-2)-assisted, 30 keV Ga+ focused ion beam (FIB) has been employed to fabricate nanogap Au electrodes and has been compared to conventional FIB milling. Electrical characterization shows that I-2 assistance improves insulation resistance from 300-400 G Omega to 20-50 T Omega. Auger depth profiling reveals that the Ga concentration profile in FIB-milled samples has a peak value of 25 at. % at 7 nm and extends, with a decreasing Gaussian tail, down to 40 nm, whereas in I-2-processed samples Ga concentration is reduced below 5 at. %. I-2 assistance is found to increase minimum gap size from 8 to 16 nm and to markedly roughen Au surface morphology. (c) 2006 American Institute of Physics. (literal)
Prodotto di
Autore CNR

Incoming links:


Autore CNR di
Prodotto
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi
data.CNR.it