http://www.cnr.it/ontology/cnr/individuo/prodotto/ID307991
Characterization of Thick Film of Copper Electrodeposited for Cryogenic Applications (Articolo in rivista)
- Type
- Label
- Characterization of Thick Film of Copper Electrodeposited for Cryogenic Applications (Articolo in rivista) (literal)
- Anno
- 2014-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1149/2.0801410jes (literal)
- Alternative label
Fava, A.; Lucci, M.; Faso, D.; Luzzi, A.; Salvato, M.; Vecchione, A.; Fittipaldi, R.; Ottaviani, I.; Colantoni, I.; Tomellini, M.; Davoli, I. (2014)
Characterization of Thick Film of Copper Electrodeposited for Cryogenic Applications
in Journal of the Electrochemical Society
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Fava, A.; Lucci, M.; Faso, D.; Luzzi, A.; Salvato, M.; Vecchione, A.; Fittipaldi, R.; Ottaviani, I.; Colantoni, I.; Tomellini, M.; Davoli, I. (literal)
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- ISI Web of Science (WOS) (literal)
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- University of Rome Tor Vergata; CECOM; CNR SPIN UOS Salerno; University of Rome Tor Vergata (literal)
- Titolo
- Characterization of Thick Film of Copper Electrodeposited for Cryogenic Applications (literal)
- Abstract
- We report on the characterization of electroformed copper. Different copper films have been deposited, on a brass rod, paying attention to modify only one parameter of the galvanic bath for each specimen (acidity, temperature, density of current, etc.). The samples obtained have been analyzed by residual resistivity ratio (RRR) to evaluated the electrical conductivity, with the nanoindenter to measure the hardness and the reduced modulus and with the X-ray diffraction to calculate the average dimensions of the grains. The comparative analysis of all the data gives us the set of parameters required to obtain a good electrical conductor, working at cryogenic temperatures and mechanically resistant. (C) 2014 The Electrochemical Society. All rights reserved. (literal)
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