Maskless, fast and highly selective etching of fused silica with gaseous fluorine and gaseous hydrogen fluoride (Articolo in rivista)

Type

• Prodotto della ricerca (Classe)
• Articolo in rivista (Classe)

Label

• Maskless, fast and highly selective etching of fused silica with gaseous fluorine and gaseous hydrogen fluoride (Articolo in rivista) (literal)

Anno

• 2014-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1088/0960-1317/24/2/025004 (literal)

Alternative label

• Venturini, Francesco; Vazquez, Rebeca Martinez; Osellame, Roberto; Cerullo, Giulio; Sansotera, Maurizio; Navarrini, Walter (2014)
  Maskless, fast and highly selective etching of fused silica with gaseous fluorine and gaseous hydrogen fluoride
  in Journal of micromechanics and microengineering (Print)
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Venturini, Francesco; Vazquez, Rebeca Martinez; Osellame, Roberto; Cerullo, Giulio; Sansotera, Maurizio; Navarrini, Walter (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 24 (literal)

Rivista

• Journal of micromechanics and microengineering (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali

• 7 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo

• 2 (literal)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• Polytechnic University of Milan; Consorzio Interuniv Nazl Sci Tecnol Mat; Consiglio Nazionale delle Ricerche (CNR) (literal)

Titolo

• Maskless, fast and highly selective etching of fused silica with gaseous fluorine and gaseous hydrogen fluoride (literal)

Abstract

• In this paper, we have directly buried microchannels in a fused silica substrate using femtosecond laser irradiation followed by chemical etching. By exploiting a synergic effect between gaseous hydrofluoric acid and fluorine (F-2), we have obtained microchannels having an outstanding aspect ratio of 86 with a relative etching speed of 17 mu m min(-1). Using fluorine we successfully regenerated the etchant 'in situ', thus providing a way to control the bore shape, in particular, the strong conically shaped microchannel can be adjusted by modifying the etching mixture composition. We have avoided water formation during the microchannel construction, thus overcoming one of the major limits that prevents any further increase in the length and the aspect ratio. (literal)

Prodotto di

• Istituto di fotonica e nanotecnologie (IFN) (Istituto)

Autore CNR

• REBECA MARTINEZ VAZQUEZ (Persona)
• ROBERTO OSELLAME (Unità di personale interno)
• GIULIO NICOLA CERULLO (Unità di personale esterno)

Insieme di parole chiave

• Keywords of "Maskless, fast and highly selective etching of fused silica with gaseous fluorine and gaseous hydrogen fluoride" (Insieme di parole chiave)

Incoming links:

Autore CNR di

• ROBERTO OSELLAME (Unità di personale interno)
• REBECA MARTINEZ VAZQUEZ (Persona)
• GIULIO NICOLA CERULLO (Unità di personale esterno)

Prodotto

• Istituto di fotonica e nanotecnologie (IFN) (Istituto)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Journal of micromechanics and microengineering (Rivista)

Insieme di parole chiave di

• Keywords of "Maskless, fast and highly selective etching of fused silica with gaseous fluorine and gaseous hydrogen fluoride" (Insieme di parole chiave)