http://www.cnr.it/ontology/cnr/individuo/prodotto/ID302974
Deposition of hydroxyl functionalized films by means of ethylene aerosol-assisted atmospheric pressure plasma (Articolo in rivista)
- Type
- Label
- Deposition of hydroxyl functionalized films by means of ethylene aerosol-assisted atmospheric pressure plasma (Articolo in rivista) (literal)
- Anno
- 2014-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1002/ppap.201400066 (literal)
- Alternative label
Yang, Yiwei; Camporeale, Giuseppe; Sardella, Eloisa; Dilecce, Giorgio; Wu, Jongshinn; Palumbo, Fabio; Favia, Pietro (2014)
Deposition of hydroxyl functionalized films by means of ethylene aerosol-assisted atmospheric pressure plasma
in Plasma processes and polymers (Print)
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Yang, Yiwei; Camporeale, Giuseppe; Sardella, Eloisa; Dilecce, Giorgio; Wu, Jongshinn; Palumbo, Fabio; Favia, Pietro (literal)
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- http://www.scopus.com/record/display.url?eid=2-s2.0-84911446416&origin=inward (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
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- National Chiao Tung University Taiwan; Universita degli Studi di Bari; Istituto Di Metodologie Inorganiche E Dei Plasmi, Monterotondo Scalo (literal)
- Titolo
- Deposition of hydroxyl functionalized films by means of ethylene aerosol-assisted atmospheric pressure plasma (literal)
- Abstract
- The atmospheric pressure plasma deposition of hydroxyl functionalized hydrocarbon films is reported in this work, with a reactor fed with water aerosol and ethylene. The effects of power and feed flow rates onto film chemistry have been investigated. Coatings produced with this approach can find application in the biomedical field, among others, as platforms for cell adhesion and proliferation. Results show that operating at 4 kHz provides a much higher amount of hydroxyl group in the coating compared with samples obtained at 11 kHz. After water immersion, the stability of the films and their amount of hydroxyl groups remain high. A simplified deposition mechanism is proposed. (literal)
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