http://www.cnr.it/ontology/cnr/individuo/prodotto/ID301071
Ab initio study of Ge intercalation in epitaxial graphene on SiC(0001) (Articolo in rivista)
- Type
- Label
- Ab initio study of Ge intercalation in epitaxial graphene on SiC(0001) (Articolo in rivista) (literal)
- Anno
- 2011-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1143/APEX.4.125101 (literal)
- Alternative label
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Deretzis I.; La Magna A. (literal)
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- http://www.scopus.com/inward/record.url?eid=2-s2.0-83455228382&partnerID=q2rCbXpz (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
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- Istituto per la Microelettronica e Microsistemi, IMM, CNR, Z.I. VIII Strada 5, 95121 Catania, Italy (literal)
- Titolo
- Ab initio study of Ge intercalation in epitaxial graphene on SiC(0001) (literal)
- Abstract
- We study within a van der Waals density functional theory framework the structural and electronic properties of Ge-intercalated epitaxial graphene on SiC(0001). We argue that the insertion of Ge adatoms at the graphene/SiC interface results in an almost complete detachment of the graphitic layer from the substrate. A stable electron-doped phase is obtained as a result of the pinning of the Fermi level by sp 3-type Ge danglingbond states. Stability is preserved when germanium atoms substitute Si/C atoms of the SiC substrate, while it is compromised when Ge is additionally chemisorbed on the graphene surface. Results are in good agreement with recent experiments. © 2011 The Japan Society of Applied Physics. (literal)
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