http://www.cnr.it/ontology/cnr/individuo/prodotto/ID299218

Blue and UV combined photolithographic polymerization for the patterning of thick structures (Articolo in rivista)

Type

Label

Blue and UV combined photolithographic polymerization for the patterning of thick structures (Articolo in rivista) (literal)

Anno

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

Alternative label

Fantino E.; Vitale A.; Quaglio M.; Cocuzza M.; Pirri C.F.; Bongiovanni R. (2015)
Blue and UV combined photolithographic polymerization for the patterning of thick structures
in Chemical engineering journal ( Print); Elsevier Sequoia, Lausanne (Svizzera)
(literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

Fantino E.; Vitale A.; Quaglio M.; Cocuzza M.; Pirri C.F.; Bongiovanni R. (literal)

Pagina inizio

Pagina fine

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url

http://www.scopus.com/inward/record.url?eid=2-s2.0-84921793685&partnerID=q2rCbXpz (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

Rivista

Note

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

Department of Applied Science and Technology, Politecnico di Torino, C.so Duca degli Abruzzi 24, Torino, 10129, Italy; Consorzio Interuniversitario Nazionale per la Scienza e Tecnologia dei Materiali, Via Giusti 9, Firenze, 50121, Italy; Center for Space Human Robotics at PoliTo, Istituto Italiano di Tecnologia, C.so Trento 21, Torino, 10129, Italy; CNR-IMEM, Parco Area delle Scienze 37a, Parma, 43124, Italy (literal)

Titolo

Blue and UV combined photolithographic polymerization for the patterning of thick structures (literal)

Abstract

This work proposes the realization of a thick multi-layer patterned structure using a photolithographic technique which combines two photopolymerization processes and two different wavelengths: UV and visible light. Multilayer structures are constructed by a simultaneous curing and bonding of layers of different materials after casting immiscible resins in one step and let them stratifying in the mold. The use of two different wavelengths allows the fabrication of patterned structures formed by two different materials, i.e. a siloxane acrylic layer superimposed and strongly adherent onto an epoxy layer. The optimization of the two reactions was done varying the photoinitiator systems, the irradiation time and selecting the right wavelength. (literal)

Editore