http://www.cnr.it/ontology/cnr/individuo/prodotto/ID284906
Mechanism of Ohmic contact formation in Ti/Al bilayers on AlGaN/GaN heterostructures with a different crystalline quality (Contributo in atti di convegno)
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- Mechanism of Ohmic contact formation in Ti/Al bilayers on AlGaN/GaN heterostructures with a different crystalline quality (Contributo in atti di convegno) (literal)
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- 2014-01-01T00:00:00+01:00 (literal)
- Alternative label
G. Greco 1, F. Iucolano 2, C. Bongiorno 1, S. Di Franco 1, F. Giannazzo 1, M. Leszczy?ski 3, F. Roccaforte 1 (2014)
Mechanism of Ohmic contact formation in Ti/Al bilayers on AlGaN/GaN heterostructures with a different crystalline quality
in 38th Workshop on Compound Semiconductors Devices and Integrated Circuits (WOCSDICE2014), Delphi (Greece), 15-18 June, 2014
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- G. Greco 1, F. Iucolano 2, C. Bongiorno 1, S. Di Franco 1, F. Giannazzo 1, M. Leszczy?ski 3, F. Roccaforte 1 (literal)
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- Proceedings of the 38th Workshop on Compound Semiconductors Devices and Integrated Circuits (WOCSDICE2014) and 12th Expert Evaluation and Control of Compound Semiconductor Materials and Technology (EXMATEC2014) (literal)
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- 1 CNR-IMM, Catania, Italy
2 STMicroelectronics, Catania, Italy
3 Institute of High Pressure Physics, University of Warsaw, Poland (literal)
- Titolo
- Mechanism of Ohmic contact formation in Ti/Al bilayers on AlGaN/GaN heterostructures with a different crystalline quality (literal)
- Abstract
- In this paper, the electrical and structural properties of Ti/Al Ohmic contacts have been investigated comparing AlGaN/GaN heterostructures with different dislocation density. The annealing temperature leading to Ohmic be-haviour is related to the material quality of the substrate. Moreover a different temperature dependence of the spe-cific contact resistance RC has been observed. (literal)
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