Closed loop control of penetration depth during CO2 laser lap welding processes (Articolo in rivista)

Type

• Prodotto della ricerca (Classe)
• Articolo in rivista (Classe)

Label

• Closed loop control of penetration depth during CO2 laser lap welding processes (Articolo in rivista) (literal)

Anno

• 2012-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.3390/s120811077 (literal)

Alternative label

• Sibillano T., Rizzi D., Mezzapesa F.P., Lugarà P.M., Konuk A.R, Aarts R., Huis in't Veld B., Ancona A. (2012)
  Closed loop control of penetration depth during CO2 laser lap welding processes
  in Sensors (Basel)
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Sibillano T., Rizzi D., Mezzapesa F.P., Lugarà P.M., Konuk A.R, Aarts R., Huis in't Veld B., Ancona A. (literal)

Pagina inizio

• 11077 (literal)

Pagina fine

• 11090 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#altreInformazioni

• cited By (since 1996)1 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url

• http://www.scopus.com/inward/record.url?eid=2-s2.0-84865400426&partnerID=40&md5=3c4f2e4f6b5f90931c644c96b0d80ecc (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 12 (literal)

Rivista

• Sensors (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo

• 8 (literal)

Note

• ISI Web of Science (WOS) (literal)
• Scopu (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• CNR-IFN Institute for Photonics and Nanotechnologies, UOS Bari, 70126 Bari, Italy Laboratory of Mechanical Automation, University of Twente, 7500 AE Enschede, Netherlands (literal)

Titolo

• Closed loop control of penetration depth during CO2 laser lap welding processes (literal)

Abstract

• In this paper we describe a novel spectroscopic closed loop control system capable of stabilizing the penetration depth during laser welding processes by controlling the laser power. Our novel approach is to analyze the optical emission from the laser generated plasma plume above the keyhole, to calculate its electron temperature as a process-monitoring signal. Laser power has been controlled by using a quantitative relationship between the penetration depth and the plasma electron temperature. The sensor is able to correlate in real time the difference between the measured electron temperature and its reference value for the requested penetration depth. Accordingly the closed loop system adjusts the power, thus maintaining the penetration depth. (literal)

Prodotto di

• Istituto di fotonica e nanotecnologie (IFN) (Istituto)
• Fotonica per il manufacturing: processi laser e sensori (MD.P03.011.005) (Modulo)

Autore CNR

• TERESA SIBILLANO (Unità di personale interno)
• PIETRO MARIO LUGARA' (Persona)
• FRANCESCO PAOLO MEZZAPESA (Persona)
• Domenico Rizzi (Persona)
• ANTONIO ANCONA (Persona)

Incoming links:

Prodotto

• Istituto di fotonica e nanotecnologie (IFN) (Istituto)
• Fotonica per il manufacturing: processi laser e sensori (MD.P03.011.005) (Modulo)

Autore CNR di

• ANTONIO ANCONA (Persona)
• PIETRO MARIO LUGARA' (Persona)
• FRANCESCO PAOLO MEZZAPESA (Persona)
• TERESA SIBILLANO (Unità di personale interno)
• Domenico Rizzi (Persona)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Sensors (Rivista)