Phosphorus in-diffusion from a surface source by millisecond flash lamp annealing for shallow emitter solar cells (Articolo in rivista)

Type
Label
  • Phosphorus in-diffusion from a surface source by millisecond flash lamp annealing for shallow emitter solar cells (Articolo in rivista) (literal)
Anno
  • 2013-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1063/1.4800781 (literal)
Alternative label
  • Normann HB, Vines L, Privitera V, Skorupa W, Schumann T, Svensson BG, Monakhov EV (2013)
    Phosphorus in-diffusion from a surface source by millisecond flash lamp annealing for shallow emitter solar cells
    in Applied physics letters
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Normann HB, Vines L, Privitera V, Skorupa W, Schumann T, Svensson BG, Monakhov EV (literal)
Pagina inizio
  • 132108 (literal)
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  • 102 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 13 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • [ 1 ] Univ Oslo, Dept Phys, Ctr Mat Sci & Nanotechnol, N-0316 Oslo, Norway [ 2 ] CNR IMM, I-95121 Catania, Italy [ 3 ] Helmholtz Zentrum Dresden Rossendorf, Inst Ion Beam Phys & Mat Res, D-01328 Dresden, Germany (literal)
Titolo
  • Phosphorus in-diffusion from a surface source by millisecond flash lamp annealing for shallow emitter solar cells (literal)
Abstract
  • We have investigated in-diffusion of phosphorus into monocrystalline silicon by depositing a phosphorus source on the surface followed by millisecond flash lamp annealing (FLA) to form shallow emitters for solar cells. By varying both the energy density of a 20 ms flash in the range from 62 to 132 J/cm(2) and the sample preheating, it is observed that FLA treatments can in-diffuse a high concentration of phosphorus atoms becoming electrically active. The most promising emitters are obtained after FLA in the energy range from 110 to 128 J/cm(2) including preheating at 300 degrees C with a peak concentration of 4 - 6 x 10(20) cm(-3). The emitter junction depth for these treatments is in the range of 100 nm to 200 nm, respectively. (literal)
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