Lateral uniformity of the transport properties of graphene/4H-SiC (0001) interface by nanoscale current measurements (Contributo in atti di convegno)

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  • Lateral uniformity of the transport properties of graphene/4H-SiC (0001) interface by nanoscale current measurements (Contributo in atti di convegno) (literal)
Anno
  • 2010-01-01T00:00:00+01:00 (literal)
Alternative label
  • Giannazzo F, Sonde S, Huntzinger JR, Tiberj A, Yakimova R, Raineri V, Camassel J (2010)
    Lateral uniformity of the transport properties of graphene/4H-SiC (0001) interface by nanoscale current measurements
    in MRS Fall Meeting, Boston Ma (USA), 30 November 2009 through 4 December 2009
    (literal)
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  • Giannazzo F, Sonde S, Huntzinger JR, Tiberj A, Yakimova R, Raineri V, Camassel J (literal)
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  • 20 (literal)
Pagina fine
  • 25 (literal)
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  • 1205 (literal)
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  • 6 (literal)
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  • CNR -IMM, Strada VIII, 5, 95121, Catania, Italy; Scuola Superiore di Catania, Via San Nullo, 5/I, 95123, Catania, Italy; GES, CNRS, Université Montpellier 2, 34095 Montpellier cedex 5, France; IFM, Linkoping University, Linkoping, Sweden (literal)
Titolo
  • Lateral uniformity of the transport properties of graphene/4H-SiC (0001) interface by nanoscale current measurements (literal)
Abstract
  • Conductive Atomic Force Microscopy was applied to study the lateral uniformity of current transport at the interface between graphene and 4H-SiC, both in the case of epitaxial graphene (EG) grown on the Si face of 4H-SiC and in the case of graphene exfoliated from HOPG and deposited (DG) on the same substrate. This comparison is aimed to investigate the role played by the C-rich buffer layer present at EG/4H-SiC interface and absent in the case of DG/4H-SiC. The distribution of the local Schottky barrier heights at EG/4H-SiC interface (? EG) was compared with the distribution measured at DG/4H-SiC interface (? DG), showing that ? EG (0.36±0.1eV) is ~0.49eV lower than ? DG (0.85 ± 0.06eV). This difference is explained in terms of the Fermi level pinning ~0.49eV above the Dirac point in EG, due to the presence of positively charged states at the interface between the Si face of 4H-SiC and the buffer layer. (literal)
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