Nanostructured rhodium films for advanced mirrors produced by Pulsed Laser Deposition (Articolo in rivista)

Type

• Articolo in rivista (Classe)
• Prodotto della ricerca (Classe)

Label

• Nanostructured rhodium films for advanced mirrors produced by Pulsed Laser Deposition (Articolo in rivista) (literal)

Anno

• 2013-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1016/j.jnucmat.2012.08.046 (literal)

Alternative label

• Uccello, A [ 1 ] ; Dellasega, D [ 1,2 ] ; Perissinotto, S [ 3 ] ; Lecis, N [ 4 ] ; Passoni, M [ 1,2 ] (2013)
  Nanostructured rhodium films for advanced mirrors produced by Pulsed Laser Deposition
  in Journal of nuclear materials
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Uccello, A [ 1 ] ; Dellasega, D [ 1,2 ] ; Perissinotto, S [ 3 ] ; Lecis, N [ 4 ] ; Passoni, M [ 1,2 ] (literal)

Pagina inizio

• 261 (literal)

Pagina fine

• 265 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url

• http://www.sciencedirect.com/science/article/pii/S0022311512004631 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 432 (literal)

Rivista

• Journal of nuclear materials (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo

• 1-3 (literal)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• [ 1 ] Politecn Milan, Dipartimento Energia, I-20133 Milan, Italy [ 2 ] EURATOM ENEA CNR Assoc, Ist Fis Plasma, Consiglio Nazl Ric, Milan, Italy [ 3 ] Ist Italiano Tecnol, Ctr Nano Sci & Technol Polimi, Milan, Italy [ 4 ] Politecn Milan, Dipartimento Meccan, I-20133 Milan, Italy (literal)

Titolo

• Nanostructured rhodium films for advanced mirrors produced by Pulsed Laser Deposition (literal)

Abstract

• In this paper advantages in the production by Pulsed Laser Deposition (PLD) of nanostructured, nanoengineered rhodium films to be used in tokamak First Mirrors (FMs) are shown. The peculiar PLD capability to tailor film structure at the nanoscale gives the possibility to-deposit low roughness Rh films with a wide variety of structures and morphologies. By a proper movimentation of the substrate and using high fluence (10-19 J/cm(2)) infrared laser pulses, it has been possible to deposit planar and homogeneous Rh films effectively suppressing surface defects on areas of the order of 10 cm(2) with a satisfactory specular reflectivity. Multilayer deposition has been exploited to produce coatings with high adhesion and good mechanical properties. Finally, an estimation of the requirements to produce by PLD rhodium films suitable for the requests of ITER is provided. (c) 2012 Elsevier B.V. All rights reserved. (literal)

Prodotto di

• Istituto di fisica del plasma \"Piero Caldirola\" (IFP) (Istituto)
• Sviluppo di Impianti e Strumentazione per i Plasmi e per la Fusione Termonucleare (ET.P05.002.001) (Modulo)

Autore CNR

• MATTEO PASSONI (Unità di personale esterno)
• DAVID DELLASEGA (Unità di personale esterno)

Incoming links:

Prodotto

• Istituto di fisica del plasma \"Piero Caldirola\" (IFP) (Istituto)
• Sviluppo di Impianti e Strumentazione per i Plasmi e per la Fusione Termonucleare (ET.P05.002.001) (Modulo)

Autore CNR di

• DAVID DELLASEGA (Unità di personale esterno)
• MATTEO PASSONI (Unità di personale esterno)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Journal of nuclear materials (Rivista)