http://www.cnr.it/ontology/cnr/individuo/prodotto/ID263774
Automatic Langmuir probe measurement in a magnetron sputtering system (Articolo in rivista)
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- Automatic Langmuir probe measurement in a magnetron sputtering system (Articolo in rivista) (literal)
- Anno
- 1999-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1016/s0257-8972(99)00122-x (literal)
- Alternative label
Spolaore M.; Antoni V.; Bagatin M.; Buffa A.; Cavazzana R.; Desideri D.; Martines E.; Pomaro N.; Serianni G.; Tramontin L. (1999)
Automatic Langmuir probe measurement in a magnetron sputtering system
in Surface & coatings technology; ELSEVIER SCIENCE SA LAUSANNE, PO BOX 564, 1001 LAUSANNE 1 (Svizzera)
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- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Spolaore M.; Antoni V.; Bagatin M.; Buffa A.; Cavazzana R.; Desideri D.; Martines E.; Pomaro N.; Serianni G.; Tramontin L. (literal)
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- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#altreInformazioni
- ISI Document Delivery No.: 259VG Times Cited: 12 Cited Reference Count: 10 Spolaore, M Antoni, V Bagatin, M Buffa, A Cavazzana, R Desideri, D Martines, E Pomaro, N Serianni, G Tramontin, L 6th International Conference on Plasma Surface Engineering (PSE 98) Sep 14-18, 1998 Garmisch partenki, germany European Joint Comm Plasma & Ion Surface Engn Martines, Emilio/B-1418-2009 Martines, Emilio/0000-0002-4181-2959 12 Elsevier science sa Lausanne.
La rivista è pubblicata anche online con ISSN 1879-3347. (literal)
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- http://ac.els-cdn.com/S025789729900122X/1-s2.0-S025789729900122X-main.pdf?_tid=95d5a416-34ed-11e3-b070-00000aacb361&acdnat=1381768257_b2cf21f88e0eb8eb532fc4325a291914 (literal)
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- ISI Web of Science (WOS) (literal)
- Scopu (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- Consorzio RFX, Corso Stati Uniti 4, I-35127 Padua, Italy (literal)
- Titolo
- Automatic Langmuir probe measurement in a magnetron sputtering system (literal)
- Abstract
- The electron temperature, ion density, plasma potential and magnetic field are measured in a plasma produced by a magnetron sputtering device. The magnetic field has been mapped by measuring the axial and radial components with Hall probes. The plasma parameters have been measured by a diagnostic system consisting of several Langmuir probes with different collecting areas that can be positioned by a linear translator. The automatic analysis system allows one to take into account non-saturation of the ion current due to sheath thickness variation. The Langmuir probes have been used in various conditions of magnetic field and source power with a gas filling pressure of 1 Pa. It has been found that the diagnostic system gives reliable measurements of the plasma parameters in static and inhomogeneous magnetic fields. (C) 1999 Elsevier Science S.A. All rights reserved. (literal)
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