Collective behavior of block copolymer thin films within periodic topographical structures (Articolo in rivista)

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Label
  • Collective behavior of block copolymer thin films within periodic topographical structures (Articolo in rivista) (literal)
Anno
  • 2013-01-01T00:00:00+01:00 (literal)
Alternative label
  • Perego, M. and Andreozzi, A. and Vellei, A. and Ferrarese Lupi, F. and Seguini, G. (2013)
    Collective behavior of block copolymer thin films within periodic topographical structures
    in Nanotechnology (Bristol, Online)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Perego, M. and Andreozzi, A. and Vellei, A. and Ferrarese Lupi, F. and Seguini, G. (literal)
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  • cited By (since 1996)1 (literal)
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  • http://www.scopus.com/inward/record.url?eid=2-s2.0-84878291821&partnerID=40&md5=2fccc0492b2ae6915f10cc09d0261c6f (literal)
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  • 24 (literal)
Rivista
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  • 24 (literal)
Note
  • Scopu (literal)
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  • Laboratorio MDM, IMM-CNR, Via C Olivetti 2, I-20864 Agrate Brianza (MB), Italy (literal)
Titolo
  • Collective behavior of block copolymer thin films within periodic topographical structures (literal)
Abstract
  • We perform a systematic study of the effect of adjacent nanostructures on the confinement of block copolymers (BCP) within pre-patterned trenches in 100 nm thick SiO2 films. Asymmetric PS-b-PMMA BCP with a styrene fraction of 0.71 (literal)
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