http://www.cnr.it/ontology/cnr/individuo/prodotto/ID260507
Towards high frequency performances of ultra-low voltage OTFTs: Combining self-alignment and hybrid, nanosized dielectrics (Articolo in rivista)
- Type
- Label
- Towards high frequency performances of ultra-low voltage OTFTs: Combining self-alignment and hybrid, nanosized dielectrics (Articolo in rivista) (literal)
- Anno
- 2013-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1016/j.orgel.2012.11.032 (literal)
- Alternative label
Lai S. [ 1 ] ; Cosseddu P. [ 1,2 ] ; Gazzadi G. C. [ 2 ] ; Barbaro M. [ 1 ] ; Bonfiglio A. [ 1,2 ] (2013)
Towards high frequency performances of ultra-low voltage OTFTs: Combining self-alignment and hybrid, nanosized dielectrics
in Organic electronics (Print)
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Lai S. [ 1 ] ; Cosseddu P. [ 1,2 ] ; Gazzadi G. C. [ 2 ] ; Barbaro M. [ 1 ] ; Bonfiglio A. [ 1,2 ] (literal)
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- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
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- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- [ 1 ] Univ Cagliari, Dept Elect & Elect Engn, I-09123 Cagliari, Italy
[ 2 ] CNR Inst Nanosci, I-41125 Modena, Italy (literal)
- Titolo
- Towards high frequency performances of ultra-low voltage OTFTs: Combining self-alignment and hybrid, nanosized dielectrics (literal)
- Abstract
- By combining an ultra-thin dielectric layer with a self-aligning process, an ultra-low voltage Organic Thin-Film Transistor (OTFT) with a 100 kHz cutoff frequency was obtained. The devices are fabricated using a single-mask, photolithographic self-alignment technique compatible with the use of standard photoresists and not requiring any further chemical treatment. This technique allows a dramatic reduction of the parasitic capacitances thus leading to a remarkable increase of the cutoff frequency, even with organic semiconductors with a relatively low mobility. These characteristics make the reported approach suitable for the fabrication of basic building blocks for high frequency applications. In this paper, the main electrical parameters of ultra-low voltage, self-aligned devices are reported, and their complete frequency characterization is provided. (literal)
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