Advances in glass Microfabrication Femtosecond laser irradiation followed by chemical etching (Articolo in rivista)

Type
Label
  • Advances in glass Microfabrication Femtosecond laser irradiation followed by chemical etching (Articolo in rivista) (literal)
Anno
  • 2012-01-01T00:00:00+01:00 (literal)
Alternative label
  • Venturini, Francesco and Sansotera, Maurizio and Osellame, Roberto and Cerullo, Giulio and Navarrini, Walter (2012)
    Advances in glass Microfabrication Femtosecond laser irradiation followed by chemical etching
    in Chimica oggi (Testo stamp.)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Venturini, Francesco and Sansotera, Maurizio and Osellame, Roberto and Cerullo, Giulio and Navarrini, Walter (literal)
Pagina inizio
  • 10 (literal)
Pagina fine
  • 12 (literal)
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  • 30 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 6 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Venturini, F (Reprint Author), Politecn Milan, Dipartimento Chim Mat & Ingn Chim Giulio Natta, Via Luigi Mancinelli 7, I-20133 Milan, Italy. Venturini, Francesco; Sansotera, Maurizio; Navarrini, Walter, Politecn Milan, Dipartimento Chim Mat & Ingn Chim Giulio Natta, I-20133 Milan, Italy. Osellame, Roberto; Cerullo, Giulio, Politecn Milan, Dipartimento Fis, Ist Foton & Nanotecnol CNR, I-20133 Milan, Italy. (literal)
Titolo
  • Advances in glass Microfabrication Femtosecond laser irradiation followed by chemical etching (literal)
Abstract
  • Femtosecond laser irradiation followed by chemical etching (F.L.I.C.E.) is an emerging technique for the fabrication of directly buried, three-dimensional microfluidic channels in silica. The procedure attested in literature, which has been widely studied in the past years, consists of irradiating a glass slab and subsequently apply a chemical etching step. The results obtained by different research groups vary widely. In this paper we present a review of the most recent advancements of this technique discussing several critical factors that affect the aspect ratio, the length and the etching speed of the microchannel. (literal)
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