Selective Growth of alpha-Sexithiophene by Using Silicon Oxides Patterns (Articolo in rivista)

Type
Label
  • Selective Growth of alpha-Sexithiophene by Using Silicon Oxides Patterns (Articolo in rivista) (literal)
Anno
  • 2011-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.3390/ijms12095719 (literal)
Alternative label
  • Albonetti, C; Barbalinardo, M; Milita, S; Cavallini, M; Liscio, F; Moulin, JF; Biscarini, F (2011)
    Selective Growth of alpha-Sexithiophene by Using Silicon Oxides Patterns
    in International journal of molecular sciences (Print)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Albonetti, C; Barbalinardo, M; Milita, S; Cavallini, M; Liscio, F; Moulin, JF; Biscarini, F (literal)
Pagina inizio
  • 5719 (literal)
Pagina fine
  • 5735 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 12 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 7 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 9 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Inst Study Nanostruct Mat, CNR ISMN, I-40129 Bologna, Italy; Inst Microelect & Microsyst, CNR IMM, I-40129 Bologna, Italy; Forschungszentrum Geesthacht GmbH, GKSS, D-21502 Geesthacht, Germany (literal)
Titolo
  • Selective Growth of alpha-Sexithiophene by Using Silicon Oxides Patterns (literal)
Abstract
  • A process for fabricating ordered organic films on large area is presented. The process allows growing sexithiophene ultra-thin films at precise locations on patterned Si/SiOx substrates by driving the orientation of growth. This process combines the parallel local anodic oxidation of Si/SiOx substrates with the selective arrangement of molecular ultra-thin film. The former is used to fabricate silicon oxide arrays of parallel lines of 400 nm in width over an area of 1 cm(2). Selective growth arises from the interplay between kinetic growth parameters and preferential interactions with the patterned surface. The result is an ultra-thin film of organic molecules that is conformal to the features of the fabricated motives. (literal)
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