Oxidation-reduction reactions at as-grown Fe/NiO interface (Articolo in rivista)

Type

• Prodotto della ricerca (Classe)
• Articolo in rivista (Classe)

Label

• Oxidation-reduction reactions at as-grown Fe/NiO interface (Articolo in rivista) (literal)

Anno

• 2003-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1016/S0039-6028(03)00119-5 (literal)

Alternative label

• P. Luches, M. Liberati, S. Valeri (2003)
  Oxidation-reduction reactions at as-grown Fe/NiO interface
  in Surface science; ELSEVIER SCIENCE BV, PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS, AMSTERDAM (Paesi Bassi)
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• P. Luches, M. Liberati, S. Valeri (literal)

Pagina inizio

• 409 (literal)

Pagina fine

• 414 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url

• http://www.sciencedirect.com/science/article/pii/S0039602803001195 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 532 (literal)

Rivista

• Surface science (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali

• 6 (literal)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• INFM--National Center on nanoStructures and bioSystems at Surfaces (S3) and Dipartimento di Fisica, Università di Modena e Reggio Emilia, Via Campi 213/a, 41100 Modena, Italy (literal)

Titolo

• Oxidation-reduction reactions at as-grown Fe/NiO interface (literal)

Abstract

• Fe films 1-10 ML thick were grown in ultrahigh vacuum by thermal deposition on a 10 ML NiO(001) film pre-deposited on an Ag(001) substrate. X-ray photoelectron spectroscopy, low energy electron diffraction and scattering-interference of energetic primary electrons were used in order to investigate the chemical and structural modifications of the Fe film and of the Fe/NiO interface. The film morphology has been checked by STM. Room temperature deposition results in a nearly continuous, tetragonally distorted bcc Fe film with Fe(001)parallel toNiO(001) and Fe[110]parallel toNiO[100] orientation. We obtained clear quantitative evidence of NiO reduction at the metal/oxide interface and of Fe overlayer oxidation. The chemical modification involves the NiO film for a thickness of 1-3 ML, depending on the thickness of the deposited Fe film. Post-deposition annealing above the NiO Neel temperature (540 K) increases the overall crystalline quality of the Fe overlayers, but also extends the thickness of the interfacial reduced layer and the amount of Fe oxidation. (C) 2003 Elsevier Science B.V. All rights reserved. (literal)

Editore

• ELSEVIER SCIENCE BV, PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS (Editore)

Prodotto di

• Nanofabbricazione e fenomeni di superficie interfaccia alla nanoscala (MD.P06.013.001) (Modulo)

Autore CNR

• PAOLA LUCHES (Persona)
• SERGIO VALERI (Persona)

Insieme di parole chiave

• Parole chiave di "Oxidation-reduction reactions at as-grown Fe/NiO interface" (Insieme di parole chiave)

Incoming links:

Autore CNR di

• PAOLA LUCHES (Persona)
• SERGIO VALERI (Persona)

Prodotto

• Nanofabbricazione e fenomeni di superficie interfaccia alla nanoscala (MD.P06.013.001) (Modulo)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Surface science (Rivista)

Editore di

• ELSEVIER SCIENCE BV, PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS (Editore)

Insieme di parole chiave di

• Parole chiave di "Oxidation-reduction reactions at as-grown Fe/NiO interface" (Insieme di parole chiave)