http://www.cnr.it/ontology/cnr/individuo/prodotto/ID24932
Improved electrical stability in asymmetric fingered polysilicon Thin Film Transistors (Articolo in rivista)
- Type
- Label
- Improved electrical stability in asymmetric fingered polysilicon Thin Film Transistors (Articolo in rivista) (literal)
- Anno
- 2006-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1063/1.2354420 (literal)
- Alternative label
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- M. Cuscunà; L. Mariucci; G. Fortunato; A. Bonfiglietti; A. Pecora; A. Valletta (literal)
- Pagina inizio
- Pagina fine
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- CNR, IFN, Via Cineto Romano 42, I-00156 Rome, Italy (literal)
- Titolo
- Improved electrical stability in asymmetric fingered polysilicon Thin Film Transistors (literal)
- Abstract
- The authors studied the electrical stability of the asymmetric fingered polysilicon thin film transistors (AF-TFTs) at different bias-stress conditions by using a new test structure with an additional contact on the n(+)-floating region. This structure allows to measure the two subchannel TFT (sub-TFT) electrical characteristics before and after bias stressing. The AF-TFTs show a very stable saturation regime, even when bias stressing at very high V-ds, where the electrical characteristics of both sub-TFTs are degraded. The authors concluded that stability of the AF-TFTs is related to the specific operation of the device rather than to immunity of this structure to hot carrier effects. (literal)
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- Autore CNR
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