One-dimensional capacitative micromachined ultrasonic transducer arrays for echographic probes (Articolo in rivista)

Type

• Prodotto della ricerca (Classe)
• Articolo in rivista (Classe)

Label

• One-dimensional capacitative micromachined ultrasonic transducer arrays for echographic probes (Articolo in rivista) (literal)

Anno

• 2004-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1016/j.mee.2004.03.025 (literal)

Alternative label

• E. Cianci 1; A. Minotti 1; V. Foglietti 1; G. Caliano 2; M. Pappalardo 2. (2004)
  One-dimensional capacitative micromachined ultrasonic transducer arrays for echographic probes
  in Microelectronic engineering
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• E. Cianci 1; A. Minotti 1; V. Foglietti 1; G. Caliano 2; M. Pappalardo 2. (literal)

Pagina inizio

• 502 (literal)

Pagina fine

• 507 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 73 (literal)

Rivista

• Microelectronic engineering (Rivista)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• 1 Istituto Fotonica e Nanotecnologie CNR, Via Cineto Romano 42, 00156 Roma, Italy 2 Dipartmento di Ingegneria Elettronica, Università Roma Tre, Via della Vasca Navale 84, 00146 Roma, Italy (literal)

Titolo

• One-dimensional capacitative micromachined ultrasonic transducer arrays for echographic probes (literal)

Abstract

• In this paper we report the design and the fabrication process for a 64-element capacitive micromachined ultrasonic transducer (cMUT) array, for application in medical imaging. The element size and separation between adjacent elements are chosen for operation at 7 MHz, a frequency typically used in tissue imaging. The fabrication process is based on surface micromachining techniques and is compatible with standard CMOS process, due to the materials used and the low-temperature deposition steps (PECVD silicon nitride for structural layer, evaporated chromium as sacrificial layer and sputtered aluminum for metallization). Electrical tests in air show typical resonance behaviour and no significant degradation during operation. Tests in water show wide bandwidth and pulse-echo operation (literal)

Prodotto di

• Istituto di fotonica e nanotecnologie (IFN) (Istituto)

Autore CNR

• ELENA CIANCI (Persona)
• VITTORIO FOGLIETTI (Persona)

Incoming links:

Prodotto

• Istituto di fotonica e nanotecnologie (IFN) (Istituto)

Autore CNR di

• ELENA CIANCI (Persona)
• VITTORIO FOGLIETTI (Persona)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Microelectronic engineering (Rivista)