http://www.cnr.it/ontology/cnr/individuo/prodotto/ID245201

SU-8 based Processes for the Realization of RF MEMS Structures (Contributo in atti di convegno)

Type

Label

SU-8 based Processes for the Realization of RF MEMS Structures (Contributo in atti di convegno) (literal)

Anno

Alternative label

Andrea Lucibello, Giorgio De Angelis, Marco Maiani, Emanuela Proietti, Romolo Marcelli (2009)
SU-8 based Processes for the Realization of RF MEMS Structures
in 10th International Symposium on RF MEMS and RF Microsystems, MEMSWAVE 2009, Trento, 6 - 8 July 2009
(literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

Andrea Lucibello, Giorgio De Angelis, Marco Maiani, Emanuela Proietti, Romolo Marcelli (literal)

Pagina inizio

Pagina fine

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#titoloVolume

Proceedings of the 10th International Symposium on RF MEMS and RF Microsystems, MEMSWAVE 2009 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

Titolo

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autoriVolume

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#curatoriVolume

Abstract

Abstract -- The utilization of the SU-8 negative photoresist for the realization of RF MEMS switches has been studie d. The key elements of the exploited process are the Shipley 1818 positive photo-resist and the Microchem SU-8 negative one. The two polymeric materials are widely used in MEMS device processes because of their excellent thermal and chemical stability. In this paper, both polymers have been utilized to get suspended structures as double clamped beams: (i) SU-8 for the lateral supports, and (ii) S1818 as a sacrificial layer for the release of the suspended membrane. (literal)

Editore