EBL- and AFM-based techniques for nanowires fabrication on Si/sige (Articolo in rivista)

Type
Label
  • EBL- and AFM-based techniques for nanowires fabrication on Si/sige (Articolo in rivista) (literal)
Anno
  • 2002-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1016/S0928-4931(01)00483-0 (literal)
Alternative label
  • Notargiacomo A a., Giovine E. b, Evangelisti F. a b, Foglietti V. b, Leoni R. b (2002)
    EBL- and AFM-based techniques for nanowires fabrication on Si/sige
    in MATERIALS SCIENCE & ENGINEERING C-MATERIALS FOR BIOLOGICAL APPLICATIONS
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Notargiacomo A a., Giovine E. b, Evangelisti F. a b, Foglietti V. b, Leoni R. b (literal)
Pagina inizio
  • 185 (literal)
Pagina fine
  • 188 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 19 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • a Unità INFM, Dipartimento di Fisica \"E. Amaldi\", Università di Roma TRE, Via della Vasca Navale 84, 00146 Rome, Italy b Istituto di Elettronica dello Stato Solido, IESS-CNR, Via Cineto Romano 42, 00156 Rome, Italy (literal)
Titolo
  • EBL- and AFM-based techniques for nanowires fabrication on Si/sige (literal)
Abstract
  • Two approaches for sub-100 nm patterning are applied to Si/SiGe samples. The first one combines electron beam lithography (EBL) and anisotropic wet etching to fabricate wires with triangular section whose top width is narrower than the beam size. Widths as small as 20 nm on silicon and 60 nm on Si/SiGe heterostructures are obtained. The second lithographic approach is based on the local anodization of an aluminum film induced by an atomic force scanning probe. Using atomic force microscopy (AFM) anodization and selective wet etching, aluminum and aluminum oxide nanostructures are obtained and used as masks for reactive ion etching (RIE). Sub-100 nm wide wires are fabricated on Si/SiGe substrates. (literal)
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