http://www.cnr.it/ontology/cnr/individuo/prodotto/ID240441
Selective activation and passivation of nanoparticle catalysts through substrate mediation (Articolo in rivista)
- Type
- Label
- Selective activation and passivation of nanoparticle catalysts through substrate mediation (Articolo in rivista) (literal)
- Anno
- 2003-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1021/la035223s (literal)
- Alternative label
Prabhakaran, K (Prabhakaran, K); Watanabe, Y (Watanabe, Y); Homma, Y (Homma, Y); Ogino, T (Ogino, T); Wei, BQ (Wei, BQ); Ajayan, PM (Ajayan, PM); Shafi, KVPM (Shafi, KVPM); Ulman, A (Ulman, A); Heun, S (Heun, S); Locatelli, A (Locatelli, A); Cherifi, S (Cherifi, S) (2003)
Selective activation and passivation of nanoparticle catalysts through substrate mediation
in Langmuir
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Prabhakaran, K (Prabhakaran, K); Watanabe, Y (Watanabe, Y); Homma, Y (Homma, Y); Ogino, T (Ogino, T); Wei, BQ (Wei, BQ); Ajayan, PM (Ajayan, PM); Shafi, KVPM (Shafi, KVPM); Ulman, A (Ulman, A); Heun, S (Heun, S); Locatelli, A (Locatelli, A); Cherifi, S (Cherifi, S) (literal)
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- Rivista
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- [ 1 ] NTT Corp, Basic Res Labs, Kanagawa 2430198, Japan
[ 2 ] Rensselaer Polytech Inst, Dept Mat Sci & Engn, Troy, NY 12180 USA
[ 3 ] Polytech Univ, Dept Chem Engn & Chem, Metrotech Ctr 6, Brooklyn, NY 11201 USA
[ 4 ] Sincrotrone Trieste, I-34012 Trieste, Italy (literal)
- Titolo
- Selective activation and passivation of nanoparticle catalysts through substrate mediation (literal)
- Abstract
- Fe nanoparticles are synthesized on a silicon wafer, by the reduction of Fe(2)O(3) nanoparticles, through a bonding partner change reaction involving silicon atoms from the substrate. On a silicon surface with germanium nanostructures grown on it, the catalyst particles are selectively activated and passivated. This has been achieved primarily by exploiting the vast differences in the reduction temperature of the oxide particles on silicon and germanium surfaces. We demonstrate this by growing carbon nanotubes selectively interconnecting the germanium nanostructures. The mechanisms of activation and passivation are discussed. (literal)
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