Characterization of highly photorefractive and active silica-germania sputtered thin films (Comunicazione a convegno)

Type
Label
  • Characterization of highly photorefractive and active silica-germania sputtered thin films (Comunicazione a convegno) (literal)
Anno
  • 2006-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1117/12.642291 (literal)
Alternative label
  • S. Berneschi, M. Brenci, A. Chiasera, M. Ferrari, G. Nunzi Conti, S. Pelli, S. Sebastiani, C. Tosello, G. C. Righini (2006)
    Characterization of highly photorefractive and active silica-germania sputtered thin films
    in SPIE Photonic West 2006 Integrated Optics: Devices, Materials, and Technologies X, San Jose, California USA, January 21, 2006
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • S. Berneschi, M. Brenci, A. Chiasera, M. Ferrari, G. Nunzi Conti, S. Pelli, S. Sebastiani, C. Tosello, G. C. Righini (literal)
Pagina inizio
  • 61230G-1 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 6123 (literal)
Rivista
Note
  • Scopu (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • optoelectronics and Photonics Department, N. Carrara Institute of Applied Physics, IFAC-CNR, Via Madonna del Piano 10, I-50019 Sesto Fiorentino, Firenze, Italy; Institute of Photonics and Nanotechnologies, Trento Section, IFN-CNR, Via Sommarive 14, I-38050 Povo (Trento), Italy; Physics Department, University of Trento, Via Sommarive 14, I-38050 Povo (Trento), Italy; Electronics, Computer Science and Systems Department (DEIS), Bologna University, Viale Risorgimento 2, I-40100 Bologna, Italy (literal)
Titolo
  • Characterization of highly photorefractive and active silica-germania sputtered thin films (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#isbn
  • 9780819461650 (literal)
Abstract
  • We report on the characterization of highly photorefractive Er 3+/Yb3+-doped silica-germania planar waveguides deposited by radio-frequency-magnetron-sputtering technique. Details of the deposition process in order to get low loss, single mode waveguides at 1550nm are described. The material presents an intense absorption band in the UV region and irradiation by a KrF excimer laser source produces large positive refractive index changes, without the need of particular sensitization procedures. Dark line spectroscopy of the waveguide modes at 635 nm was performed to calculate the index change under UV exposure. Highly efficient photo-induced phase gratings have been fabricated in the slab waveguide. Waveguides spectroscopic properties of the 3I13/2 <=> 3I 15/2 transition of the Er3+ ion, including lifetime and emission bandwidth, were examined. Photoluminescence excitation spectroscopy was also recorded to detect the Yb3+ to Er3+ energy transfer process. (literal)
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