XPS composition study of stacked Si oxide/Si nitride/Si oxide nano-layers (Articolo in rivista)

Type
Label
  • XPS composition study of stacked Si oxide/Si nitride/Si oxide nano-layers (Articolo in rivista) (literal)
Anno
  • 2012-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1002/sia.4943 (literal)
Alternative label
  • E. Ravizza, S. Spadoni, R. Piagge, P. Comite, C. Wiemer (2012)
    XPS composition study of stacked Si oxide/Si nitride/Si oxide nano-layers
    in Surface and interface analysis (Online)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • E. Ravizza, S. Spadoni, R. Piagge, P. Comite, C. Wiemer (literal)
Pagina inizio
  • 1209 (literal)
Pagina fine
  • 1213 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 44 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Micron, Proc R&D, I-20864 Agrate Brianza, MB, Italy IMM CNR, Lab MDM, I-20864 Agrate Brianza, MB, Italy (literal)
Titolo
  • XPS composition study of stacked Si oxide/Si nitride/Si oxide nano-layers (literal)
Abstract
  • X-ray Photoelectron Spectroscopy (XPS) was used to investigate the silicon nitride composition in stacked Si oxide/Si nitride/Si oxide nano-layers. The standard approach for stoichiometry estimation, valid for homogeneous compositions, was corrected for the case of very small thickness and thin overlayer. (literal)
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