Spherical-grating monochromator with variable-line-spaced grating for synchrotron radiation (Articolo in rivista)

Type
Label
  • Spherical-grating monochromator with variable-line-spaced grating for synchrotron radiation (Articolo in rivista) (literal)
Anno
  • 2000-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1364/AO.39.005671 (literal)
Alternative label
  • Poletto, L; Tondello, G (2000)
    Spherical-grating monochromator with variable-line-spaced grating for synchrotron radiation
    in Applied optics-OT
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Poletto, L; Tondello, G (literal)
Pagina inizio
  • 5671 (literal)
Pagina fine
  • 5678 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 39 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Univ Padua, Dept Elect & Informat, Ist Nazl Fis Mat, I-35131 Padua, Italy CNR-Istituto di Fotonica e Nanotecnologie (literal)
Titolo
  • Spherical-grating monochromator with variable-line-spaced grating for synchrotron radiation (literal)
Abstract
  • An optical design for spherical-grating monochromators for application to synchrotron radiation is presented. High spectral and spatial performance is obtained with a spherical variable-line-spaced grating coupled to a spherical mirror with its tangential plane coincident with the grating's equatorial plane. The monochromator works without an entrance slit in an off-Rowland configuration with a fixed entrance arm and demagnification on the exit slit. The law for groove-space variation of the grating compensates for the main spectral aberrations; spectral focusing in an extended energy range is ensured by a slight change in the exit arm with translations of the order of a few tens of millimeters. The inclusion of a spherical mirror ensures focusing on a plane perpendicular to the plane of spectral dispersion. The ultimate resolution is limited by the slope errors of a single spherical surface. The layout is applied to the design of a high-resolution monochromator for the 1000-250-eV region. (literal)
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