Effect of self-interstitials - nanovoids interaction on two-dimensional diffusion and activation of implanted B in Si (Contributo in atti di convegno)

Type

• Prodotto della ricerca (Classe)
• Contributo in atti di convegno (Classe)

Label

• Effect of self-interstitials - nanovoids interaction on two-dimensional diffusion and activation of implanted B in Si (Contributo in atti di convegno) (literal)

Anno

• 2005-01-01T00:00:00+01:00 (literal)

Alternative label

• F Giannazzo, E Bruno, S Mirabella, G Impellizzeri, E Napolitani, V Raineri, F Priolo, D Alquier, (2005)
  Effect of self-interstitials - nanovoids interaction on two-dimensional diffusion and activation of implanted B in Si
  in 11th International Autumn Meeting on Gettering and Defect Engineering in Semiconductor Technology (GADEST 2005), Giens, FRANCE, SEP 25-30, 2005
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• F Giannazzo, E Bruno, S Mirabella, G Impellizzeri, E Napolitani, V Raineri, F Priolo, D Alquier, (literal)

Pagina inizio

• 395 (literal)

Pagina fine

• 399 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#titoloVolume

• GETTERING AND DEFECT ENGINEERING IN SEMICONDUCTOR TECHNOLOGY XI (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 108-109 (literal)

Rivista

• Diffusion and defect data, solid state data. Part B, Solid state phenomena (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali

• 5 (literal)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• CNR, IMM, Sez Catania, I-95121 Catania, Italy Univ Catania, MATIS, INFM, I-95123 Catania, Italy Univ Catania, Dipartimento Fis & Astron, I-95123 Catania, Italy Univ Padua, MATIS, INFM, I-34131 Trieste, Italy Univ Tours, LMP, F-37071 Tours 2, France (literal)

Titolo

• Effect of self-interstitials - nanovoids interaction on two-dimensional diffusion and activation of implanted B in Si (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#isbn

• 3-908451-13-2 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#curatoriVolume

• Pichaud, B; Claverie, A; Alquier, D; Richter, H; Kittler, M (literal)

Abstract

• In this work, we investigate the effect of performing a high dose 20 keV He+ implant before the implantation of B at low energy (3 keV) in silicon and the subsequent thermal annealing at 800 degrees C. The implants were performed in laterally confined regions defined by opening windows in a SiO2 mask, in order to evidence the impact on a realistic configuration used in device fabrication. High resolution quantitative scanning capacitance microscopy (SCM) combined with cross-section transmission electron microscopy (XTEM) allowed to clarify the role of the voids distribution produced during the thermal annealing on the diffusion and electrical activation of implanted B in Si. Particular evidence was given to the effect of the uniform nanovoids distribution, which forms in the region between the surface and the buried cavity layer. (literal)

Editore

• Trans Tech Publications Ltd. (Editore)

Prodotto di

• Institute for microelectronics and microsystems (IMM) (Istituto)

Autore CNR

• SALVATORE MIRABELLA (Unità di personale interno)
• GIULIANA IMPELLIZZERI (Unità di personale interno)
• ENRICO NAPOLITANI (Persona)
• FILIPPO GIANNAZZO (Persona)

Insieme di parole chiave

• Keywords of "Effect of self-interstitials - nanovoids interaction on two-dimensional diffusion and activation of implanted B in Si" (Insieme di parole chiave)

Incoming links:

Prodotto

• Institute for microelectronics and microsystems (IMM) (Istituto)

Autore CNR di

• SALVATORE MIRABELLA (Unità di personale interno)
• FILIPPO GIANNAZZO (Persona)
• ENRICO NAPOLITANI (Persona)
• GIULIANA IMPELLIZZERI (Unità di personale interno)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Diffusion and defect data, solid state data. Part B, Solid state phenomena (Rivista)

Editore di

• Trans Tech Publications Ltd. (Editore)

Insieme di parole chiave di

• Keywords of "Effect of self-interstitials - nanovoids interaction on two-dimensional diffusion and activation of implanted B in Si" (Insieme di parole chiave)