http://www.cnr.it/ontology/cnr/individuo/prodotto/ID229549
Statistical Analysis of Dark Current in Silicon Photomultipliers (Contributo in atti di convegno)
- Type
- Label
- Statistical Analysis of Dark Current in Silicon Photomultipliers (Contributo in atti di convegno) (literal)
- Anno
- 2011-01-01T00:00:00+01:00 (literal)
- Alternative label
Giuseppina Valvo, Alfio Russo, Delfo Sanfilippo, Giovanni Condorelli, Clarice Di Martino, Beatrice Carbone, PierGiorgio Fallica, Roberto Pagano, Sebania Libertino, Salvatore Lombardo (2011)
Statistical Analysis of Dark Current in Silicon Photomultipliers
in The Second International Conference on Sensor Device Technologies and Applications SENSORDEVICES 2011, Nice/Saint Laurent du Var, France, August 21-27, 2011
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Giuseppina Valvo, Alfio Russo, Delfo Sanfilippo, Giovanni Condorelli, Clarice Di Martino, Beatrice Carbone, PierGiorgio Fallica, Roberto Pagano, Sebania Libertino, Salvatore Lombardo (literal)
- Pagina inizio
- Pagina fine
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#titoloVolume
- IEEE Sensors 2011: The Second International Conference on Sensor Device Technologies and Applications (literal)
- Rivista
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- IMS-R&D STMicroelectronics, stradale Primosole, 50, 95121 Catania, ITALY;
CNR-IMM, Ottava Strada Zona Industriale, 5, 95121 Catania, ITALY (literal)
- Titolo
- Statistical Analysis of Dark Current in Silicon Photomultipliers (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#isbn
- 978-1-61208-145-8 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autoriVolume
- Abstract
- The aim of this paper is to investigate on a statistical
basis at the wafer level the relationship existing among the
dark currents of the single pixel compared to the whole Silicon
Photomultiplier array. This is the first time to our knowledge
that such a comparison is made, crucial to pass this new
technology to the semiconductor manufacturing standards. In
particular, emission microscopy measurements and current
measurements allowed us to conclude that optical trenches
strongly improve the device performances. (literal)
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