Experimental investigation of powder formation in SiF4-H2 and SiH4-H2 Discharges (Contributo in atti di convegno)

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Label
  • Experimental investigation of powder formation in SiF4-H2 and SiH4-H2 Discharges (Contributo in atti di convegno) (literal)
Anno
  • 1998-01-01T00:00:00+01:00 (literal)
Alternative label
  • V. A. Shakhatov1, M. Striccoli1, G. Cicala2 and G. Bruno2 (1998)
    Experimental investigation of powder formation in SiF4-H2 and SiH4-H2 Discharges
    in XIVth Europhysics Sectional Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG-XIV), Malahide, (Ireland), August 1998
    (literal)
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  • V. A. Shakhatov1, M. Striccoli1, G. Cicala2 and G. Bruno2 (literal)
Pagina inizio
  • 468 (literal)
Pagina fine
  • 469 (literal)
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  • XIVth Europhysics Sectional Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG-XIV) Proceedings (literal)
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  • 22H (literal)
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  • 22H (literal)
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  • 2 (literal)
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  • 1Centro Laser, S.P. Casamassima km3, 70010, Valenzano, Bari, Italy; 2Centro di Studio per la Chimica dei Plasmi CNR, Via Orabona, 4-70126 Bari, Italy (literal)
Titolo
  • Experimental investigation of powder formation in SiF4-H2 and SiH4-H2 Discharges (literal)
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  • Europhysics Conference Abstracts is published by European Physical Society 1998 (literal)
Abstract
  • Radiofrequency discharges (13.56 MHz) of SiH4-H2 and SiF4-H2 mixtures are widely used in plasma enhanced chemical vapor deposition (PECVD) of hydrogenated amorphous silicon films, employed in photovoltaic and electronic applications. Since powder formation in these low pressure r.f. discharges is a serious concern, in the last years, great attention has been placed on the particle genesis study. In this work, we report on preliminary results on He-Ne laser Mie scattering in SiF4-H2 plasma. A comparison with results obtained in SiH4-H2 plasma is also reported. (literal)
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