http://www.cnr.it/ontology/cnr/individuo/prodotto/ID229360
Plasma Deposition of Hydrofluorinated Amorphous Silicon-Carbon Alloys (Contributo in atti di convegno)
- Type
- Label
- Plasma Deposition of Hydrofluorinated Amorphous Silicon-Carbon Alloys (Contributo in atti di convegno) (literal)
- Anno
- 1996-01-01T00:00:00+01:00 (literal)
- Alternative label
G. Cicala1, G. Bruno1, P. Capezzuto2 (1996)
Plasma Deposition of Hydrofluorinated Amorphous Silicon-Carbon Alloys
in XIIIth Europhysics Sectional Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG-XIII), Poprad (Slovakia), 27-30 August 1996
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- G. Cicala1, G. Bruno1, P. Capezzuto2 (literal)
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- XIIIth Europhysics Sectional Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG-XIII) Proceedings (literal)
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- 1Centro di Studio per la Chimica dei Plasmi CNR, Via Orabona, 4-70126 Bari, Italy;
2Dipartimento di Chimica Universita` di Bari, Via Orabona, 4-70126 Bari, Italy (literal)
- Titolo
- Plasma Deposition of Hydrofluorinated Amorphous Silicon-Carbon Alloys (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#curatoriVolume
- Europhysics Conference Abstracts is published by European Physical Society 1996 (literal)
- Abstract
- Hydrofluorinated amorphous silicon-carbon alloys (a-SiC:H,F) are obtained by plasma decomposition of SiF4-CH4-H2 mixture. Small addition of CH4 to SiF4-H2 mixture produces silicon carbon alloys with C incorporation up to 70%. In this contribute, we report results on the joined analysis of the plasma phase carried out by mass spectrometry (MS), and of the resultant material, by Fourier Transform InfraRed spectroscopy (FTIR) and X-ray Photoelectron Spectroscpy (XPS), in order to get information about the film growth chemistry. (literal)
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