An integrated Si-based electro-optical modulator (Contributo in atti di convegno)

Type
Label
  • An integrated Si-based electro-optical modulator (Contributo in atti di convegno) (literal)
Anno
  • 2004-01-01T00:00:00+01:00 (literal)
Alternative label
  • A. Sciuto, S. Libertino, S. Coffa, G. Coppola (2004)
    An integrated Si-based electro-optical modulator
    in Conference Optics and Photonic Integrated Circuits, Strasbourg, FRANCE, APR 27-29, 2004
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • A. Sciuto, S. Libertino, S. Coffa, G. Coppola (literal)
Pagina inizio
  • 227 (literal)
Pagina fine
  • 230 (literal)
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  • INTEGRATED OPTICS AND PHOTONIC INTEGRATED CIRCUITS (literal)
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  • 5451 (literal)
Rivista
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  • 4 (literal)
Note
  • ISI Web of Science (WOS) (literal)
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  • CNR-IMM, sez. Catania, Str.le Primosole 50, Catania, Italy 95121 STMicroelectronics Catania, Str.le Primosole 50, Catania, Italy 95121 CNR-IMM, sez. Napoli, Via P. Castellino 111, Napoli, Italy 80131 (literal)
Titolo
  • An integrated Si-based electro-optical modulator (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#isbn
  • 0-8194-5374-9 (literal)
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  • AA.VV. (literal)
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  • G. C. Righini, S. Honkanen (literal)
Abstract
  • Optical interconnects are, nowadays, considered a promising alternative to electrical ones and monolithic integration in Si is the only choice when high volumes, low fabrication costs and reduced spaces are needed. We fabricated an electro-optic Si-based modulator working at 1.5 mum using a Bipolar Mode Field-Effect transistor integrated within a Si rib waveguide. The principle of operation is the light absorption by a plasma of free carrier that can be opportunely moved inside or outside the device optical channel by properly changing the bias. The optical channel of the modulator is embodied within its vertical electrical channel. The devices were fabricated using epitaxial Si wafers and standard clean room processing. The optical characterization in static conditions shows a modulation depth, defined as M=(P-Off -P-On)/P-Off - 90 %. It was measured at 1.48 gm using a laser diode source coupled with the modulator through a silica optical fiber. The dynamic electrical characterization provides an electrical switching time of approximate to10 ns. A modulation depth of 72 % is observed at 100kHz electrical modulation frequency. (literal)
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