http://www.cnr.it/ontology/cnr/individuo/prodotto/ID222580
CHEMICAL VAPOR DEPOSITION OF ZRO2 THIN-FILMS USING ZR(NET2)4 AS PRECURSOR (Articolo in rivista)
- Type
- Label
- CHEMICAL VAPOR DEPOSITION OF ZRO2 THIN-FILMS USING ZR(NET2)4 AS PRECURSOR (Articolo in rivista) (literal)
- Anno
- 1995-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1051/jphyscol:1995561 (literal)
- Alternative label
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- BASTIANINI A.; BATTISTON G.A.; GERBASI R.; PORCHIA M.; DAOLIO S. (literal)
- Pagina inizio
- Pagina fine
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#altreInformazioni
- Proceedings of the Tenth European Conference on Chemical Vapour Deposition (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
- http://jp4.journaldephysique.org/articles/jp4/abs/1995/05/jp4199505C561/jp4199505C561.html (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- 1-4 : CNR,IST CHIM & TECNOL INORGAN & MAT AVANZATI,CORSO STATI UNITI 4,I-35127 PADUA,ITALY. /
5 : CNR,IST POLAROG & ELETTROCHIM PREPARAT,I-35127 PADUA,ITALY (literal)
- Titolo
- CHEMICAL VAPOR DEPOSITION OF ZRO2 THIN-FILMS USING ZR(NET2)4 AS PRECURSOR (literal)
- Abstract
- By using tetrakis(diethylamido) zirconium [Zr(NEt(2))(4)]. excellent quality ZrO2 thin films were deposited with high growth rates on alumina and glass substrates by chemical vapor deposition. The depositions were carried out in a hot wall reactor at reduced pressure (200 Pa) in the temperature range 500-580 degrees C and in the presence of oxygen. The as-grown films are colourless. smooth and well-adherent to the substrates. SIMS analysis evidenced pure ZrO2 with a slight superficial contamination of hydrocarbons and nitrogen The films have a tapered polycrystalline columnar structure well risible in SEM micrographs. From X-ray diffraction analysis. the monoclinic phase resulted as the major phase together with a small variable amount of tetragonal zirconia Under 550 degrees C the as-grown films resulted highly textured and were dominated by the (020) orientation. The films were annealed in the range 600-1000 degrees C and the effect of annealing on the texture and on the phase and dimensions of the crystallites have been studied (literal)
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