Nano-Electro-Structural Evolution of Ni-Si Ohmic Contacts to 3C-SiC (Articolo in rivista)

Type
Label
  • Nano-Electro-Structural Evolution of Ni-Si Ohmic Contacts to 3C-SiC (Articolo in rivista) (literal)
Anno
  • 2009-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.4028/www.scientific.net/MSF.615-617.569 (literal)
Alternative label
  • Eriksson, J; Roccaforte, F; Giannazzo, F; Lo Nigro, R; Moschetti, G; Raineri, V; Lorenzzi, J; Ferro, G (2009)
    Nano-Electro-Structural Evolution of Ni-Si Ohmic Contacts to 3C-SiC
    in Materials science forum
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Eriksson, J; Roccaforte, F; Giannazzo, F; Lo Nigro, R; Moschetti, G; Raineri, V; Lorenzzi, J; Ferro, G (literal)
Pagina inizio
  • 569 (literal)
Pagina fine
  • 572 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 615-617 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • CNR-IMM, I-95121 Catania, Italy Univ Catania, Scuola Super, Catania, Italy UCB Lyon 1, CNRS, LMI, UMR 5615, F-69622 Villeurbanne, France (literal)
Titolo
  • Nano-Electro-Structural Evolution of Ni-Si Ohmic Contacts to 3C-SiC (literal)
Abstract
  • This paper reports oil the macro- and nanoscale electro-structural evolution, as a function of annealing temperature, of nickel-silicide Ohmic contacts to 3C-SiC, grown on 6H-SiC substrates by a Vapor-Liquid-Solid (VLS) technique. The structural and electrical characterization of the contacts, carried Out by combining different techniques, showed a correlation between the annealing temperature and the electrical characteristics in both the macro- and the nanoscale measurements. Increasing the annealing temperature between 600 and 950 degrees C caused a gradual increase of the uniformity of the nanoscale current-distribution, with all accompanying reduction of the specific contact resistance from 5 x 10(-5) to 8.4 x 10(-6) Omega cm(2). After high temperature annealing (950 degrees C) the structural composition of the contacts stabilized. as only the Ni(2)Si phase was detected. A comparison with previous literature findings suggests a superior crystalline quality of the single domain VLS 3C-SiC layers. (literal)
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