http://www.cnr.it/ontology/cnr/individuo/prodotto/ID22078
RF-Sputtering Deposition of Gadolinia Doped Ceria Films for IT-SOFCs Applications (Articolo in rivista)
- Type
- Label
- RF-Sputtering Deposition of Gadolinia Doped Ceria Films for IT-SOFCs Applications (Articolo in rivista) (literal)
- Anno
- 2007-01-01T00:00:00+01:00 (literal)
- Alternative label
Barison S., Fabrizio M., Mortalò C., Chiodelli G., Malavasi L., Roncari E., Sanson A. (2007)
RF-Sputtering Deposition of Gadolinia Doped Ceria Films for IT-SOFCs Applications
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Barison S., Fabrizio M., Mortalò C., Chiodelli G., Malavasi L., Roncari E., Sanson A. (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- S. Barison a, M. Fabrizio a, C. Mortalò a, G. Chiodelli b, L. Malavasi b, E. Roncari c, A. Sanson c
a IENI-CNR, Corso Stati Uniti 4 - 35127 Padova - Italy
b IENI-CNR, Viale Taramelli 16 - 27100 Pavia - Italy
c ISTEC-CNR - Via Granarolo, 64 - 48018 Faenza - Italy (literal)
- Titolo
- RF-Sputtering Deposition of Gadolinia Doped Ceria Films for IT-SOFCs Applications (literal)
- Abstract
- Solid oxide fuel cell technology offers substantial advantages for
clean and efficient power generation. However, the high working
temperatures impose severe restrictions on the materials selection.
The key to prolong the stack lifetime, widen the selection of
materials and reduce the costs lies in lowering the working
temperature. Two main approaches have been applied for this
purpose: testing materials based on Gd doped CeO2, having higher
ionic conductivity at lower temperatures, and decreasing the
electrolyte thickness. At present, different methods have been
studied for the deposition of fully dense thin coatings. Among
them, the radio frequency magnetron sputtering technique is a
powerful and versatile tool to deposit mixed oxide thin films in a
wide thickness range (100 nm÷10 ¼m). In this report, the results
about the deposition by RF magnetron sputtering of 1÷5 ¼m GDC
films on anodic substrates will be presented. (literal)
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