RF-Sputtering Deposition of Gadolinia Doped Ceria Films for IT-SOFCs Applications (Articolo in rivista)

Type
Label
  • RF-Sputtering Deposition of Gadolinia Doped Ceria Films for IT-SOFCs Applications (Articolo in rivista) (literal)
Anno
  • 2007-01-01T00:00:00+01:00 (literal)
Alternative label
  • Barison S., Fabrizio M., Mortalò C., Chiodelli G., Malavasi L., Roncari E., Sanson A. (2007)
    RF-Sputtering Deposition of Gadolinia Doped Ceria Films for IT-SOFCs Applications
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Barison S., Fabrizio M., Mortalò C., Chiodelli G., Malavasi L., Roncari E., Sanson A. (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 11 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • S. Barison a, M. Fabrizio a, C. Mortalò a, G. Chiodelli b, L. Malavasi b, E. Roncari c, A. Sanson c a IENI-CNR, Corso Stati Uniti 4 - 35127 Padova - Italy b IENI-CNR, Viale Taramelli 16 - 27100 Pavia - Italy c ISTEC-CNR - Via Granarolo, 64 - 48018 Faenza - Italy (literal)
Titolo
  • RF-Sputtering Deposition of Gadolinia Doped Ceria Films for IT-SOFCs Applications (literal)
Abstract
  • Solid oxide fuel cell technology offers substantial advantages for clean and efficient power generation. However, the high working temperatures impose severe restrictions on the materials selection. The key to prolong the stack lifetime, widen the selection of materials and reduce the costs lies in lowering the working temperature. Two main approaches have been applied for this purpose: testing materials based on Gd doped CeO2, having higher ionic conductivity at lower temperatures, and decreasing the electrolyte thickness. At present, different methods have been studied for the deposition of fully dense thin coatings. Among them, the radio frequency magnetron sputtering technique is a powerful and versatile tool to deposit mixed oxide thin films in a wide thickness range (100 nm÷10 ¼m). In this report, the results about the deposition by RF magnetron sputtering of 1÷5 ¼m GDC films on anodic substrates will be presented. (literal)
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