http://www.cnr.it/ontology/cnr/individuo/prodotto/ID219270

Molybdenum sputtering film characterization for high gradient accelerating structures (Articolo in rivista)

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Molybdenum sputtering film characterization for high gradient accelerating structures (Articolo in rivista) (literal)

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Alternative label

S. Bini (1); B. Spataro (1); A. Marcelli (1,2); Stefano Sarti (3); V.A. Dolgashev 4); S.Tantawi (4); A.D. Yeremian (4); Y. Higashi (5); M.G. Grimaldi (6); L. Romano (6); F. Ruffino (6); R. Parodi (7); G. Cibin (8); C. Marrelli (9); M. Migliorati (9); C. Caliendo (10) (2013)
Molybdenum sputtering film characterization for high gradient accelerating structures
in Chinese Physics C, High Energy Physics and Nuclear Physics; CHINESE PHYSICAL SOC., BEIJING (Cina)
(literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

S. Bini (1); B. Spataro (1); A. Marcelli (1,2); Stefano Sarti (3); V.A. Dolgashev 4); S.Tantawi (4); A.D. Yeremian (4); Y. Higashi (5); M.G. Grimaldi (6); L. Romano (6); F. Ruffino (6); R. Parodi (7); G. Cibin (8); C. Marrelli (9); M. Migliorati (9); C. Caliendo (10) (literal)

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(1) INFN-LNF, Via E. Fermi 40, Frascati (RM) 00044, Italy; (2) NSRL, University of Science and Technology of China, Chinese Academy of Sciences, Hefei 230029, China; (3) University of Rome-Sapienza, Dipartimento di Fisica, Piazzale Aldo Moro 5, Rome 00185, Italy; (4) SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, CA 94025, USA; (5) KEK 1-1 Oho, Tsukuba, Ibaraki 305, Japan; (6) University of Catania, Dipartimento di Fisica e Astronomia & MATIS-IMM-CNR, Via S. So a 64, Catania 95123, Italy; (7) INFN-Genova, Via Dodecaneso 33, Genova 16146, Italy; (8) Diamond Light Source, Chilton, Didcot, Oxford OX110DE, UK; (9) University of Roma-Sapienza, Dipartimento di Scienze di Base e Applicate per l'Ingegneria, Via A. Scarpa, Roma 14-00161-Italy; (10) Istituto dei Sistemi Complessi, ISC-CNR, Area della Ricerca di Roma 1, Via Salaria km 29. 300, Monterotondo, Rome 00040, Italy (literal)

Titolo

Molybdenum sputtering film characterization for high gradient accelerating structures (literal)

Abstract

Technological advancements are strongly required to fulll the demands of new accelerator devices with the highest accelerating gradients and operation reliability for the future colliders. To this purpose an extensive R&D regarding molybdenum coatings on copper is in progress. In this contribution we describe chemical composition, deposition quality and resistivity properties of different molybdenum coatings obtained via sputtering. The deposited lms are thick metallic disorder layers with different resistivity values above and below the molibdenum dioxide reference value. Chemical and electrical properties of these sputtered coatings have been characterized by Rutherford backscattering, XANES and photoemission spectroscopy.We will also consider multiple cells standing wave section coated by a molybdenum layer designed to improve the performance of X-Band accelerating systems. (literal)

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