Fast formation of ripples induced by AFM. A new method for patterning polymers on nanoscale (Articolo in rivista)

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Label
  • Fast formation of ripples induced by AFM. A new method for patterning polymers on nanoscale (Articolo in rivista) (literal)
Anno
  • 2007-01-01T00:00:00+01:00 (literal)
Alternative label
  • D'Acunto, M; Napolitano, S; Pingue, P; Giusti, P; Rolla, P (2007)
    Fast formation of ripples induced by AFM. A new method for patterning polymers on nanoscale
    in Materials letters (Gen. ed.)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • D'Acunto, M; Napolitano, S; Pingue, P; Giusti, P; Rolla, P (literal)
Pagina inizio
  • 3305 (literal)
Pagina fine
  • 3309 (literal)
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  • 61 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Univ Pisa, Dept Chem Engn & Mat Sci, I-56126 Pisa, Italy; Univ Pisa, Dept Phys, I-56127 Pisa, Italy; CNR, INFM PolyLab, I-56127 Pisa, Italy; Katholieke Univ Leuven, Dept Phys & Astron, Lab Acoust & Thermal Phys, B-3001 Heverlee, Belgium; CNR, INFM, NEST, I-56100 Pisa, Italy; Scuola Normale Super Pisa, I-56100 Pisa, Italy; CNR, Inst Composite & Biocompatible Mat, Pisa, Italy (literal)
Titolo
  • Fast formation of ripples induced by AFM. A new method for patterning polymers on nanoscale (literal)
Abstract
  • The possibility to control the assembly of molecules on a given substrate is particularly important for polymeric systems. Self-assembly of polymer chains on a substrate can be controlled by modifying selectively the chemistry of the substrate surface and/or the polymer itself in order to create patterned polymer films with tailored length scales. A novel tool to change the polymer morphology in order to achieve the requested superficial structures and textures is the atomic force microscopy (AFM). In this paper, we shall demonstrate how to obtain ordered ripple structures induced by an AFM tip on a polymer thin film. It is well known that a polymer surface scanned by a probe tip can change its morphology assuming typical ripple structures. These structures however are expected to be formed for high applied loads (> 10 nN) and after many scanning cycles (> 10). On the contrary, we shall show how to obtain the ripple formation just by a single AFM scan and for relatively low applied loads. Such ripple structures can be modulated and modified by changing the applied load, scanning velocity and angle. In this way, it is possible to obtain sinusoidal structures with suitable amplitude, periodicity and orientation. Beyond the general contribution to the development of nanolithography, the patterns obtained by this method can find many applications in biomaterial polymer science (such as scaffolds for cell proliferation in tissue engineering). (c) 2006 Elsevier B.V. All rights reserved. (literal)
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