http://www.cnr.it/ontology/cnr/individuo/prodotto/ID21482
Influence of electrochemical processing on the composition and microstructure of chemical-vapor deposited Ru and RuO2 nanocrystalline films (Articolo in rivista)
- Type
- Label
- Influence of electrochemical processing on the composition and microstructure of chemical-vapor deposited Ru and RuO2 nanocrystalline films (Articolo in rivista) (literal)
- Anno
- 2002-01-01T00:00:00+01:00 (literal)
- Alternative label
S. Barison, D. Barreca, S. Daolio, M. Fabrizio, E. Tondello (2002)
Influence of electrochemical processing on the composition and microstructure of chemical-vapor deposited Ru and RuO2 nanocrystalline films
in Journal of materials chemistry (Print)
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- S. Barison, D. Barreca, S. Daolio, M. Fabrizio, E. Tondello (literal)
- Pagina inizio
- Pagina fine
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- Rivista
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- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- 1,3,4: IENI CNR, Corso Stati Uniti 4, I-35127 Padova, Italy
2,5: ISTM CNR, Dipart. CIMA, Universita` di Padova, Via Marzolo 1, I-35131 Padova, Italy (literal)
- Titolo
- Influence of electrochemical processing on the composition and microstructure of chemical-vapor deposited Ru and RuO2 nanocrystalline films (literal)
- Abstract
- Modifications of nanocrystalline RuO2 and Ru films, chemical-vapor deposited on Ti substrates, are studied in
aqueous media, at the initial stages of electrocatalytic O2 evolution. The microstructure, composition and
morphology of the films are examined ex situ by X-ray diffraction (XRD), X-ray photoelectron spectroscopy
(XPS), secondary ion mass spectrometry (SIMS) and atomic force microscopy (AFM). Results concerning the
influence of electrochemical processing on the chemico-physical properties and electrode behavior are presented
and discussed. (literal)
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- Autore CNR
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