http://www.cnr.it/ontology/cnr/individuo/prodotto/ID214785
Optimization of the Sputtering Deposition Parameters of Highly Oriented Piezoelectric AlN films (Abstract/Poster in atti di convegno)
- Type
- Label
- Optimization of the Sputtering Deposition Parameters of Highly Oriented Piezoelectric AlN films (Abstract/Poster in atti di convegno) (literal)
- Anno
- 2000-01-01T00:00:00+01:00 (literal)
- Alternative label
Cinzia Caliendo *, Patrizia Imperatori **, Enrico Verona * (2000)
Optimization of the Sputtering Deposition Parameters of Highly Oriented Piezoelectric AlN films
in IEEE International Ultrasonics Symposium 2000, Puerto Rico, October 22-25, 2000
(literal)
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- Cinzia Caliendo *, Patrizia Imperatori **, Enrico Verona * (literal)
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- * Istituto di Acustica Corbino, IDAC
** Istituto di Struttura della Materia, ISM (literal)
- Titolo
- Optimization of the Sputtering Deposition Parameters of Highly Oriented Piezoelectric AlN films (literal)
- Abstract
- A1N films have been succesfully
deposited by reactive sputtering technique on
silicon substrates with different interface layers.
Uniform, crack free, c-axis oriented, highly
adhesive films have been obtained in a thickness
range between 1 and 5.6 pm. Measurements of
the d33 piezoelectric strain constant have been
performed in order to evaluate the piezoelectric
characteristics of the films. X-ray diffraction
measurements (XRD) have been performed to
investigate the crystal structure and the
crystallographic orientation of the films, in order
to optimize the deposition process parameters
and to study the influence of the substrate on the
AlN polycrystals orientation. (literal)
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