Comparison of ZrxTi1-xO4 films produced by PLD and MOCVD techniques (Articolo in rivista)

Type

• Articolo in rivista (Classe)
• Prodotto della ricerca (Classe)

Label

• Comparison of ZrxTi1-xO4 films produced by PLD and MOCVD techniques (Articolo in rivista) (literal)

Anno

• 2004-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1002/sia.1863 (literal)

Alternative label

• S. Kaciulis, A. Cusmà, G. Padeletti, L. Pandolfi, M. Viticoli, C. Zaldo (2004)
  Comparison of ZrxTi1-xO4 films produced by PLD and MOCVD techniques
  in SIA. Surface and interface analysis
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• S. Kaciulis, A. Cusmà, G. Padeletti, L. Pandolfi, M. Viticoli, C. Zaldo (literal)

Pagina inizio

• 1151 (literal)

Pagina fine

• 1154 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 36 (literal)

Rivista

• SIA. Surface and interface analysis (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo

• 8 (literal)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• CNR, Ist Studio Mat Nanostrutturati, I-00016 Monterotondo, Italy CSIC, Inst Ciencia Mat, Madrid, Spain (literal)

Titolo

• Comparison of ZrxTi1-xO4 films produced by PLD and MOCVD techniques (literal)

Abstract

• ZrxTi1-xO4 (ZT) thin films have been deposited by pulsed laser deposition (PLD) and metallo-organic chemical vapour deposition (MOCVD) on Pt-covered and naked Si(100) substrates. Both techniques provide single-phased films with a columnar structure when the substrate is heated to the 500-600degreesC range. Out of this temperature range the co-existence of other titanium oxides has been shown by XRD and XPS studies. XPS results show that the composition of optimized films is constant along the film thickness and that PLD films have higher Zr concentration than MOCVD ones. Pt induces the orientation (111) of ZT films, while the higher temperature promotes either (020) ZT orientation in PLD films or (031) ZT texture in MOCVD ones. (literal)

Prodotto di

• Istituto per lo studio dei materiali nanostrutturati (ISMN) (Istituto)

Autore CNR

• GIUSEPPINA PADELETTI (Persona)
• ANTONIO CUSMA' PICCIONE CADETTO (Unità di personale interno)
• SAULIUS KACIULIS (Persona)

Insieme di parole chiave

• Keywords of "Comparison of ZrxTi1-xO4 films produced by PLD and MOCVD techniques" (Insieme di parole chiave)

Incoming links:

Prodotto

• Istituto per lo studio dei materiali nanostrutturati (ISMN) (Istituto)

Autore CNR di

• GIUSEPPINA PADELETTI (Persona)
• SAULIUS KACIULIS (Persona)
• ANTONIO CUSMA' PICCIONE CADETTO (Unità di personale interno)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• SIA. Surface and interface analysis (Rivista)

Insieme di parole chiave di

• Keywords of "Comparison of ZrxTi1-xO4 films produced by PLD and MOCVD techniques" (Insieme di parole chiave)