Synthesis and characterization of methylcyclopentadienyl-(eta(3)-allyl)platinum and its use as a metallo-organic chemical vapour deposition precursor of platinum (Articolo in rivista)

Type
Label
  • Synthesis and characterization of methylcyclopentadienyl-(eta(3)-allyl)platinum and its use as a metallo-organic chemical vapour deposition precursor of platinum (Articolo in rivista) (literal)
Anno
  • 1999-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1002/(SICI)1099-0739(199907)13:7<509::AID-AOC868>3.0.CO;2-T (literal)
Alternative label
  • Rossetto G.; P. Zanella P.; Carta G.; Bertani R.; Favretto D.; Ingo G.M. (1999)
    Synthesis and characterization of methylcyclopentadienyl-(eta(3)-allyl)platinum and its use as a metallo-organic chemical vapour deposition precursor of platinum
    in Applied organometallic chemistry
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Rossetto G.; P. Zanella P.; Carta G.; Bertani R.; Favretto D.; Ingo G.M. (literal)
Pagina inizio
  • 509 (literal)
Pagina fine
  • 513 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
  • http://onlinelibrary.wiley.com/doi/10.1002/%28SICI%291099-0739%28199907%2913:7%3C509::AID-AOC868%3E3.0.CO;2-T/abstract;jsessionid=32144EB5B654E8D393BF175C0200A0FD.d03t03 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 13 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 5 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 7 (literal)
Note
  • ISI Web of Science (WOS) (literal)
  • Scopu (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • 1-3,5 : CNR, MITER-Ist. Chim./Tecnologie I.M.A., Corso Stati Uniti 4, 35127 Padova, Italy / 4 : CNR, Ctro. Stud. Chim./Tecn. C.M.E.T., Università di Padova, Via Marzolo 9, 35100 Padova, Italy / 6 : CNR, MITER-Ist. di Chimica dei Materiali, CP 10, 00016 Monterotondo Scalo, Roma, Italy (literal)
Titolo
  • Synthesis and characterization of methylcyclopentadienyl-(eta(3)-allyl)platinum and its use as a metallo-organic chemical vapour deposition precursor of platinum (literal)
Abstract
  • This communication reports on rapid, efficient synthesis of the metal-organic chemical vapor deposition (MOCVD) precursor (methylcyclopentadienyl)allylplatinum. The compound is shown to be an effective precursor for the deposition of platinum thin films giving deposits of high quality and purity, probably due to the nature of ligands which seems to be good leaving groups as confirmed by mass spectrometric pathway. (literal)
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