Tantalum-oxide catalysed chemical vapour deposition of single- and multi-walled carbon nanotubes (Articolo in rivista)

Type
Label
  • Tantalum-oxide catalysed chemical vapour deposition of single- and multi-walled carbon nanotubes (Articolo in rivista) (literal)
Anno
  • 2013-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1039/C3RA23304A (literal)
Alternative label
  • Bernhard C. Bayer, Carla Castellarin-Cudia, Raoul Blume, Stephen A. Steiner, Caterina Ducati, Daping Chu, Andrea Goldoni, Axel Knop-Gericke,g Robert Schlögl, Cinzia Cepek, John Robertsona and Stephan Hofmann (2013)
    Tantalum-oxide catalysed chemical vapour deposition of single- and multi-walled carbon nanotubes
    in RSC advances
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Bernhard C. Bayer, Carla Castellarin-Cudia, Raoul Blume, Stephen A. Steiner, Caterina Ducati, Daping Chu, Andrea Goldoni, Axel Knop-Gericke,g Robert Schlögl, Cinzia Cepek, John Robertsona and Stephan Hofmann (literal)
Pagina inizio
  • 4086 (literal)
Pagina fine
  • 4092 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 3 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 12 (literal)
Note
  • ISI Web of Science (WOS) (literal)
  • Scopus (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Bernhard C. Bayer a, Carla Castellarin-Cudia bc, Raoul Blume d, Stephen A. Steiner e, Caterina Ducati f, Daping Chu a, Andrea Goldoni c, Axel Knop-Gericke g, Robert Schlögl g, Cinzia Cepek b, John Robertson a, and Stephan Hofmann a a: Department of Engineering, University of Cambridge, Cambridge, UK b: Istituto Officina dei Materiali-CNR, Laboratorio TASC, I-34149 Trieste, Italy c: Sincrotrone Trieste SCpA, I-34149 Trieste, Italy d: Helmholtz-Zentrum Berlin für Materialien und Energie, D-12489 Berlin, Germany e: Department of Aeronautics and Astronautics, Massachusetts Institute of Technology, Cambridge, USA f: Department of Materials Science and Metallurgy, University of Cambridge, Cambridge, UK g: Fritz-Haber-Institut der Max-Planck-Gesellschaft, D-14195 Berlin-Dahlem, Germany (literal)
Titolo
  • Tantalum-oxide catalysed chemical vapour deposition of single- and multi-walled carbon nanotubes (literal)
Abstract
  • Tantalum-oxide thin films are shown to catalyse single- and multi-walled carbon nanotube growth by chemical vapour deposition. A low film thickness, the nature of the support material (best results with SiO2) and an atmospheric process gas pressure are of key importance for successful nanotube nucleation. Strong material interactions, such as silicide formation, inhibit nanotube growth. In situ X-ray photoelectron spectroscopy indicates that no catalyst reduction to Ta-metal or Ta-carbide occurs during our nanotube growth conditions and that the catalytically active phase is the Ta-oxide phase. Such a reduction-free oxide catalyst can be technologically advantageous. (literal)
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