http://www.cnr.it/ontology/cnr/individuo/prodotto/ID210376
THE CHEMICAL ORIGIN OF SEY AT TECHNICAL SURFACES (Contributo in atti di convegno)
- Type
- Label
- THE CHEMICAL ORIGIN OF SEY AT TECHNICAL SURFACES (Contributo in atti di convegno) (literal)
- Anno
- 2013-01-01T00:00:00+01:00 (literal)
- Alternative label
R. Larciprete, D. R. Grosso, M. Commisso, Roberto Flammini, Roberto Cimino (2013)
THE CHEMICAL ORIGIN OF SEY AT TECHNICAL SURFACES
in ECLOUD12, La Biodola, Isola d'Elba, 5-9 June 2012
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- R. Larciprete, D. R. Grosso, M. Commisso, Roberto Flammini, Roberto Cimino (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- R. Larciprete (ISC-CNR)
D.R. Grosso (LNF-INFN)
M. Commisso (LNF-INFN)
R. Flammini (IMIP-CNR)
R. Cimino (LNF-INFN) (literal)
- Titolo
- THE CHEMICAL ORIGIN OF SEY AT TECHNICAL SURFACES (literal)
- Abstract
- The secondary emission yield (SEY) properties of colaminated
Cu samples for LHC beam screens are
correlated to the surface chemical composition
determined by X-ray photoelectron spectroscopy. The
surface of the \"as received\" samples is characterized by
the presence of significant quantities of contaminating
adsorbates and by the maximum of the SEY curve (dmax)
being as high as 2.2. After extended electron scrubbing at
kinetic energy of 10 and 500 eV, the dmax value drops to
the ultimate values of 1.35 and 1.1, respectively. In both
cases the surface oxidized phases are significantly
reduced, whereas only in the sample scrubbed at 500 eV
the formation of a graphitic-like C layer is observed.
We find that the electron scrubbing of technical Cu
surfaces can be described as occurring in two steps, where
the first step consists in the electron induced desorption of
weakly bound contaminants that occurs indifferently at 10
and at 500 eV and corresponds to a partial decrease of
dmax, and the second step, activated by more energetic
electrons and becoming evident at high doses, which
increases the number of graphitic-like C-C bonds via the
dissociation of adsorbates already contaminating the \"as
received\" surface or accumulating on this surface during
irradiation. Our results demonstrate how the kinetic
energy of impinging electrons is a crucial parameter when
conditioning technical surfaces of Cu and other metals by
means of electron induced chemical processing. (literal)
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