Influence of artificial pinning on vortex lattice instability in superconducting films (Articolo in rivista)

Type
Label
  • Influence of artificial pinning on vortex lattice instability in superconducting films (Articolo in rivista) (literal)
Anno
  • 2012-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1088/1367-2630/14/5/053006 (literal)
Alternative label
  • A V Silhanek1,2,8, A Leo3, G Grimaldi3,8, G R Berdiyorov4, M V Milosevic 4, A Nigro3, S Pace3, N Verellen2, W Gillijns2, V Metlushko5, B Ilic 6, Xiaobin Zhu7 and V V Moshchalkov2 (2012)
    Influence of artificial pinning on vortex lattice instability in superconducting films
    in New journal of physics
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • A V Silhanek1,2,8, A Leo3, G Grimaldi3,8, G R Berdiyorov4, M V Milosevic 4, A Nigro3, S Pace3, N Verellen2, W Gillijns2, V Metlushko5, B Ilic 6, Xiaobin Zhu7 and V V Moshchalkov2 (literal)
Pagina inizio
  • 53006 (literal)
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  • 14 (literal)
Rivista
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  • 11 (literal)
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  • 5 (literal)
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  • 1 Département de Physique, Université de Liège, Allée du 6 aot, 17, B-4000 Sart Tilman, Belgium 2 Institute for Nanoscale Physics and Chemistry, Nanoscale Superconductivity and Magnetism Group, KU Leuven, Celestijnenlaan 200D, B-3001 Leuven, Belgium 3 CNR-SPIN-Salerno and Dipartimento di Fisica 'E R Caianiello', Università degli Studi di Salerno, Via Ponte don Melillo I-84084 Fisciano (SA), Italy 4 Departement Fysica, Universiteit Antwerpen, Groenenborgerlaan 171, B-2020 Antwerpen, Belgium 5 Department of Electrical and Computer Engineering, University of Illinois, Chicago, IL 60607-0024, USA 6 Cornell Nanofabrication Facility, School of Applied and Engineering Physics, Cornell University, Ithaca, NY 14853, USA 7 Seagate Technology Inc., Fremont, CA 94538, USA 8 Authors to whom any correspondence should be addressed. (literal)
Titolo
  • Influence of artificial pinning on vortex lattice instability in superconducting films (literal)
Abstract
  • In superconducting films under an applied dc current, we analyze experimentally and theoretically the influence of engineered pinning on the vortex velocity at which the flux-flow dissipation undergoes an abrupt transition from low to high resistance. We argue, based on a nonuniform distribution of vortex velocity in the sample, that in strongly disordered systems the mean critical vortex velocity for flux-flow instability (i) has a nonmonotonic dependence on magnetic field and (ii) decreases as the pinning strength is increased. These findings challenge the generally accepted microscopic model of Larkin and Ovchinnikov (1979 J. Low. Temp. Phys. 34 409) and all subsequent refinements of this model which ignore the presence of pinning centers. (literal)
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