Organic-based distributed feedback lasers by direct electron-beam lithography on conjugated polymers (Articolo in rivista)

Type
Label
  • Organic-based distributed feedback lasers by direct electron-beam lithography on conjugated polymers (Articolo in rivista) (literal)
Anno
  • 2007-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1063/1.2779104 (literal)
Alternative label
  • Stabile, R; Camposeo, A; Persano, L; Tavazzi, S; Cingolani, R; Pisignano, D (2007)
    Organic-based distributed feedback lasers by direct electron-beam lithography on conjugated polymers
    in Applied physics letters; American Institute of Physics, Melville [NY] (Stati Uniti d'America)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Stabile, R; Camposeo, A; Persano, L; Tavazzi, S; Cingolani, R; Pisignano, D (literal)
Pagina inizio
  • 101110-1 (literal)
Pagina fine
  • 101110-3 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 91 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 3 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 10 (literal)
Note
  • Scopu (literal)
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Univ Salento, Dipartimento Ingn Innovaz & Distretto Tecnol ISUF, CNR, INFM,NNL, I-73100 Lecce, Italy; Univ Milano Bicocca, Dipartimento Sci Mat, I-20125 Milan, Italy (literal)
Titolo
  • Organic-based distributed feedback lasers by direct electron-beam lithography on conjugated polymers (literal)
Abstract
  • The authors demonstrate direct electron-beam writing on conjugated polymers as patterning route to realize plastic optoelectronic devices. Lithography was carried out by a 20 kV electron beam dose in the range of 0-360 mu C/cm(2), with no need for masking or development/etching processes. The features could be employed for the fabrication of polymer distributed feedback lasers, exhibiting optically pumped lasing in the range of 607-620 nm, with a spectral linewidth around 1 nm and a threshold excitation fluence of 34 mu J/cm(2). (literal)
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