Functionalized interfaces by plasma treatments on silicon and silicon dioxide substrates (Articolo in rivista)

Type

• Articolo in rivista (Classe)
• Prodotto della ricerca (Classe)

Label

• Functionalized interfaces by plasma treatments on silicon and silicon dioxide substrates (Articolo in rivista) (literal)

Anno

• 2007-01-01T00:00:00+01:00 (literal)

Alternative label

• Di Franco, C; Cioffi, N; Ditaranto, N; Vitiello, MS; Sibilano, M; Torsi, L; Scamarcio, G (2007)
  Functionalized interfaces by plasma treatments on silicon and silicon dioxide substrates
  in Thin solid films (Print)
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Di Franco, C; Cioffi, N; Ditaranto, N; Vitiello, MS; Sibilano, M; Torsi, L; Scamarcio, G (literal)

Pagina inizio

• 7195 (literal)

Pagina fine

• 7202 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 515 (literal)

Rivista

• Thin solid films (Rivista)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• CNR, INFM, Reg Lab LIT, Dipartimento Interateneo Fis, I-70126 Bari, Italy; Univ Bari, Dipartmento Chim, I-70126 Bari, Italy (literal)

Titolo

• Functionalized interfaces by plasma treatments on silicon and silicon dioxide substrates (literal)

Abstract

• Plasma-enhanced chemical vapour deposition has been applied to the fabrication of high-quality SiO2/Si interfaces and to the functionalization of the silicon dioxide surfaces for organic thin film transistor applications. The advantage of the method herein reported resides in the possibility of activating the substrate, depositing and functionalizing high-quality SiO2 films in a single-run process, at low temperature. The structural properties of silicon dioxide samples have been studied by infrared spectroscopy, angle resolved and depth profiling X-ray photoelectron spectroscopy. The electronic properties have been retrieved from the leakage current values and the Fowler-Nordheim current plots. (c) 2007 Elsevier B.V. All rights reserved. (literal)

Prodotto di

• Sviluppo e applicazioni di sorgenti laser infrarosse a cascata quantica, a fibra ottica e di potenza (MD.P03.011.001) (Modulo)

Autore CNR

• CINZIA DI FRANCO (Persona)
• GAETANO SCAMARCIO (Persona)
• MIRIAM SERENA VITIELLO (Persona)

Insieme di parole chiave

• Parole chiave di "Functionalized interfaces by plasma treatments on silicon and silicon dioxide substrates" (Insieme di parole chiave)

Incoming links:

Autore CNR di

• GAETANO SCAMARCIO (Persona)
• CINZIA DI FRANCO (Persona)
• MIRIAM SERENA VITIELLO (Persona)

Prodotto

• Sviluppo e applicazioni di sorgenti laser infrarosse a cascata quantica, a fibra ottica e di potenza (MD.P03.011.001) (Modulo)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Thin solid films (Rivista)

Insieme di parole chiave di

• Parole chiave di "Functionalized interfaces by plasma treatments on silicon and silicon dioxide substrates" (Insieme di parole chiave)