Fluorine in Ge: Segregation and EOR-defects stabilization (Articolo in rivista)

Type
Label
  • Fluorine in Ge: Segregation and EOR-defects stabilization (Articolo in rivista) (literal)
Anno
  • 2012-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1016/j.nimb.2011.08.039 (literal)
Alternative label
  • Boninelli S, Impellizzeri G, Priolo F, Napolitani E, Spinella C (2012)
    Fluorine in Ge: Segregation and EOR-defects stabilization
    in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (Print)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Boninelli S, Impellizzeri G, Priolo F, Napolitani E, Spinella C (literal)
Pagina inizio
  • 21 (literal)
Pagina fine
  • 24 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
  • http://scienceserver.cilea.it/cgi-bin/sciserv.pl?collection=journals&journal=0168583x&issue=v282inone_c (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 282 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 4 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • [ 1 ] Univ Catania, MATIS IMM CNR, I-95123 Catania, Italy [ 2 ] Univ Catania, Dipartimento Fis & Astron, I-95123 Catania, Italy [ 3 ] Univ Padua, Dipartimento Fis, I-35131 Padua, Italy [ 4 ] Univ Padua, MATIS IMM CNR, I-35131 Padua, Italy [ 5 ] IMM CNR, I-95121 Catania, Italy (literal)
Titolo
  • Fluorine in Ge: Segregation and EOR-defects stabilization (literal)
Abstract
  • In this paper we investigate the F behavior in Ge during solid phase epitaxy (SPE) and post-SPE annealing. Fluorine implanted with a fluence of 1 x 10(15) F/cm(2) and an energy of 35 key induced the formation of an amorphous Ge layer. Detailed chemical and structural characterizations of the as implanted and annealed samples evidenced a strong segregation of F at the moving amorphous/crystalline interface, leading to a remarkable SPE rate retardation. In addition, we observed that F accumulates in correspondence of the end of range (EOR) defects. The comparison between the thermal evolution of damage produced by self-implantation and F implantation in Ge suggests that F increases significantly the stability of EOR. Such behavior clarifies the role of F in modifying the As diffusion in Ge recently reported in literature. (literal)
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