http://www.cnr.it/ontology/cnr/individuo/prodotto/ID203390
Fluorine in Ge: Segregation and EOR-defects stabilization (Articolo in rivista)
- Type
- Label
- Fluorine in Ge: Segregation and EOR-defects stabilization (Articolo in rivista) (literal)
- Anno
- 2012-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1016/j.nimb.2011.08.039 (literal)
- Alternative label
Boninelli S, Impellizzeri G, Priolo F, Napolitani E, Spinella C (2012)
Fluorine in Ge: Segregation and EOR-defects stabilization
in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (Print)
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Boninelli S, Impellizzeri G, Priolo F, Napolitani E, Spinella C (literal)
- Pagina inizio
- Pagina fine
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- http://scienceserver.cilea.it/cgi-bin/sciserv.pl?collection=journals&journal=0168583x&issue=v282inone_c (literal)
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- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- [ 1 ] Univ Catania, MATIS IMM CNR, I-95123 Catania, Italy
[ 2 ] Univ Catania, Dipartimento Fis & Astron, I-95123 Catania, Italy
[ 3 ] Univ Padua, Dipartimento Fis, I-35131 Padua, Italy
[ 4 ] Univ Padua, MATIS IMM CNR, I-35131 Padua, Italy
[ 5 ] IMM CNR, I-95121 Catania, Italy (literal)
- Titolo
- Fluorine in Ge: Segregation and EOR-defects stabilization (literal)
- Abstract
- In this paper we investigate the F behavior in Ge during solid phase epitaxy (SPE) and post-SPE annealing. Fluorine implanted with a fluence of 1 x 10(15) F/cm(2) and an energy of 35 key induced the formation of an amorphous Ge layer. Detailed chemical and structural characterizations of the as implanted and annealed samples evidenced a strong segregation of F at the moving amorphous/crystalline interface, leading to a remarkable SPE rate retardation. In addition, we observed that F accumulates in correspondence of the end of range (EOR) defects. The comparison between the thermal evolution of damage produced by self-implantation and F implantation in Ge suggests that F increases significantly the stability of EOR. Such behavior clarifies the role of F in modifying the As diffusion in Ge recently reported in literature. (literal)
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