Extreme ultraviolet multilayer for the FERMI@Elettra free electron laser beam transport system (Articolo in rivista)

Type
Label
  • Extreme ultraviolet multilayer for the FERMI@Elettra free electron laser beam transport system (Articolo in rivista) (literal)
Anno
  • 2012-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1364/OE.20.008006 (literal)
Alternative label
  • A.J. Corso, P. Zuppella, D. Windt, M. Zangrando, M.G. Pelizzo (2012)
    Extreme ultraviolet multilayer for the FERMI@Elettra free electron laser beam transport system
    in Optics express
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • A.J. Corso, P. Zuppella, D. Windt, M. Zangrando, M.G. Pelizzo (literal)
Pagina inizio
  • 8006 (literal)
Pagina fine
  • 8014 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 20 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 7 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • 1Consiglio Nazionale delle Ricerche-Institute for Photonics and Nanotechnologies, Laboratory for Ultraviolet and X-rays Optical Research, via Trasea 7, 35131 Padova, Italy 2University of Padova, Department of Information Engineering, via Gradenigo 6B, 35131 Padova, Italy 3Reflective X-Ray Optics LLC, 1361 Amsterdam Avenue, Suite 3B, New York, New York 10027, USA 4Sincrotrone Trieste ScpA, Strada Statale 14 - km 163,5 in Area Science Park 34149, Trieste Italy (literal)
Titolo
  • Extreme ultraviolet multilayer for the FERMI@Elettra free electron laser beam transport system (literal)
Abstract
  • In this work we present the design of a Pd/B4C multilayer structure optimized for high reflectance at 6.67 nm. The structure has been deposited and also characterized along one year in order to investigate its temporal stability. This coating has been developed for the beam transport system of FERMI@Elettra Free Electron Laser: the use of an additional aperiodic capping layer on top of the structure combines the high reflectance with filter properties useful in rejecting the fundamental harmonic when the goal is to select the third FEL harmonic. (literal)
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