Micro-contact printing of poly(3-hexylthiophene) on silicon oxide: Effect of stamp stretching (Articolo in rivista)

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  • Micro-contact printing of poly(3-hexylthiophene) on silicon oxide: Effect of stamp stretching (Articolo in rivista) (literal)
Anno
  • 2010-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1016/j.eurpolymj.2010.05.010 (literal)
Alternative label
  • Guido Scavia; William Porzio; Silvia Destri; Luisa Barba; Gianmichele Arrighetti (2010)
    Micro-contact printing of poly(3-hexylthiophene) on silicon oxide: Effect of stamp stretching
    in European Polymer Journal; Editore: Elsevier, Oxford (Regno Unito)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Guido Scavia; William Porzio; Silvia Destri; Luisa Barba; Gianmichele Arrighetti (literal)
Pagina inizio
  • 1660 (literal)
Pagina fine
  • 1670 (literal)
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  • http://www.scopus.com/record/display.url?eid=2-s2.0-77955468983&origin=resultslist&sort=plf-f&src=s&st1=Scavia&st2=Guido&sid=Tco5c9d53ZpaF2YQ961qCSQ%3a100&sot=q&sdt=b&sl=32&s=TITLE-ABS-KEY-AUTH%28Scavia+Guido%29&relpos=1&relpos=1&searchTerm=TITLE-ABS-KEY-AUTH(Scavia%20Guido) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 46 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 8 (literal)
Note
  • Scopu (literal)
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Guido Scavia*, William Porzio, Silvia Destri ISMAC, CNR, Via E. Bassini 15, 20133 Milano, Italy Luisa Barba and Gianmichele Arrighetti Istituto di Cristallografia-Sincrotrone Elettra, Strada Statale 14-Km 163,5 Area Science Park, 34012 Basovizza, Trieste, Italy (literal)
Titolo
  • Micro-contact printing of poly(3-hexylthiophene) on silicon oxide: Effect of stamp stretching (literal)
Abstract
  • Micro-contact printing (mu CP) has been applied to deposit poly(3-hexylthiophene) (P3HT) layer onto silicon oxide substrate from a polydimethylsiloxane (PDMS) stamp. The effect of the stamp stretching onto the corresponding printed P3HT layer has been analysed both from morphological (AFM) and from structural (XRD) points of view. Results show an orienting effect of the stretching towards the P3HT ultimate morphological units (i.e. fibrils) along the stretching direction. The influence of other variables involved in the deposition (substrate polarity/apolarity. mechanical pressure onto the stamp) have been studied and reported. (literal)
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