http://www.cnr.it/ontology/cnr/individuo/prodotto/ID19882
Micro-contact printing of poly(3-hexylthiophene) on silicon oxide: Effect of stamp stretching (Articolo in rivista)
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- Label
- Micro-contact printing of poly(3-hexylthiophene) on silicon oxide: Effect of stamp stretching (Articolo in rivista) (literal)
- Anno
- 2010-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1016/j.eurpolymj.2010.05.010 (literal)
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- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Guido Scavia; William Porzio; Silvia Destri; Luisa Barba; Gianmichele Arrighetti (literal)
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- http://www.scopus.com/record/display.url?eid=2-s2.0-77955468983&origin=resultslist&sort=plf-f&src=s&st1=Scavia&st2=Guido&sid=Tco5c9d53ZpaF2YQ961qCSQ%3a100&sot=q&sdt=b&sl=32&s=TITLE-ABS-KEY-AUTH%28Scavia+Guido%29&relpos=1&relpos=1&searchTerm=TITLE-ABS-KEY-AUTH(Scavia%20Guido) (literal)
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- Guido Scavia*, William Porzio, Silvia Destri
ISMAC, CNR, Via E. Bassini 15, 20133 Milano, Italy
Luisa Barba and Gianmichele Arrighetti
Istituto di Cristallografia-Sincrotrone Elettra, Strada Statale 14-Km 163,5 Area Science Park, 34012 Basovizza, Trieste, Italy (literal)
- Titolo
- Micro-contact printing of poly(3-hexylthiophene) on silicon oxide: Effect of stamp stretching (literal)
- Abstract
- Micro-contact printing (mu CP) has been applied to deposit poly(3-hexylthiophene) (P3HT) layer onto silicon oxide substrate from a polydimethylsiloxane (PDMS) stamp. The effect of the stamp stretching onto the corresponding printed P3HT layer has been analysed both from morphological (AFM) and from structural (XRD) points of view. Results show an orienting effect of the stretching towards the P3HT ultimate morphological units (i.e. fibrils) along the stretching direction. The influence of other variables involved in the deposition (substrate polarity/apolarity. mechanical pressure onto the stamp) have been studied and reported. (literal)
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