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CaCu3TiO12 thin films on conductive oxide electrode: a comparative study between chemical and physical vapor deposition routes (Articolo in rivista)
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- CaCu3TiO12 thin films on conductive oxide electrode: a comparative study between chemical and physical vapor deposition routes (Articolo in rivista) (literal)
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- 2012-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1016/j.matchemphys.2012.02.024 (literal)
- Alternative label
M. R. Catalano, G. Malandrino, C. Bongiorno, R. G. Toro, P. Fiorenza, R. Bodeux, J. Wolfman, M. Gervais, C.A. Lambert, F. Gervais, R. Lo Nigro (2012)
CaCu3TiO12 thin films on conductive oxide electrode: a comparative study between chemical and physical vapor deposition routes
in Materials chemistry and physics (Print); Elsevier Sequoia, Lausanne (Svizzera)
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- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- M. R. Catalano, G. Malandrino, C. Bongiorno, R. G. Toro, P. Fiorenza, R. Bodeux, J. Wolfman, M. Gervais, C.A. Lambert, F. Gervais, R. Lo Nigro (literal)
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- Dipartimento di Scienze Chimiche, Università di Catania, UdR Catania, Viale A. Doria 6, 95125 Catania, Italy
Istituto per la Microelettronica e Microsistemi, IMM-CNR, Strada VIII 5, 95121 Catania, Italy
Istituto per Lo Studio Dei Materiali Nanostrutturati, ISMN-CNR, Via dei Taurini, 19, 00185 Roma, Italy
Laboratoire LEMA, UMR 6157 CNRS/CEA, Université F. Rabelais, Parc de Grandmont, 37200 Tours, France
STMicroelectronics, RandD, Rue Pierre et Marie Curie, 37000 Tours, France (literal)
- Titolo
- CaCu3TiO12 thin films on conductive oxide electrode: a comparative study between chemical and physical vapor deposition routes (literal)
- Abstract
- Metal Organic Chemical Vapor Deposition (MOCVD) and Pulsed Laser Deposition (PLD) techniques have been used for the growth of CaCu3Ti4O12 (CCTO) thin films on La0.9Sr1.1NiO4/LaAlO3 (LSNO/LAO) stack. (1 0 0) oriented CCTO films have been formed through both deposition routes and film complete structural and morphological characterizations have been carried out using several techniques (X-ray diffraction, scanning electron microscopy, energy-filtered transmission electron microscopy). The comparative study demonstrated some differences at the CCTO/LSNO interfaces depending on the adopted deposition technique. Chemical/structural modification of the LSNO electrode probably occurred as a function of the different oxygen partial pressure used in the PLD and MOCVD processes. (literal)
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