CaCu3TiO12 thin films on conductive oxide electrode: a comparative study between chemical and physical vapor deposition routes (Articolo in rivista)

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  • CaCu3TiO12 thin films on conductive oxide electrode: a comparative study between chemical and physical vapor deposition routes (Articolo in rivista) (literal)
Anno
  • 2012-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1016/j.matchemphys.2012.02.024 (literal)
Alternative label
  • M. R. Catalano, G. Malandrino, C. Bongiorno, R. G. Toro, P. Fiorenza, R. Bodeux, J. Wolfman, M. Gervais, C.A. Lambert, F. Gervais, R. Lo Nigro (2012)
    CaCu3TiO12 thin films on conductive oxide electrode: a comparative study between chemical and physical vapor deposition routes
    in Materials chemistry and physics (Print); Elsevier Sequoia, Lausanne (Svizzera)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • M. R. Catalano, G. Malandrino, C. Bongiorno, R. G. Toro, P. Fiorenza, R. Bodeux, J. Wolfman, M. Gervais, C.A. Lambert, F. Gervais, R. Lo Nigro (literal)
Pagina inizio
  • 1108 (literal)
Pagina fine
  • 1115 (literal)
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  • 133 (literal)
Rivista
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  • 8 (literal)
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  • 2-3 (literal)
Note
  • ISI Web of Science (WOS) (literal)
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  • Dipartimento di Scienze Chimiche, Università di Catania, UdR Catania, Viale A. Doria 6, 95125 Catania, Italy Istituto per la Microelettronica e Microsistemi, IMM-CNR, Strada VIII 5, 95121 Catania, Italy Istituto per Lo Studio Dei Materiali Nanostrutturati, ISMN-CNR, Via dei Taurini, 19, 00185 Roma, Italy Laboratoire LEMA, UMR 6157 CNRS/CEA, Université F. Rabelais, Parc de Grandmont, 37200 Tours, France STMicroelectronics, RandD, Rue Pierre et Marie Curie, 37000 Tours, France (literal)
Titolo
  • CaCu3TiO12 thin films on conductive oxide electrode: a comparative study between chemical and physical vapor deposition routes (literal)
Abstract
  • Metal Organic Chemical Vapor Deposition (MOCVD) and Pulsed Laser Deposition (PLD) techniques have been used for the growth of CaCu3Ti4O12 (CCTO) thin films on La0.9Sr1.1NiO4/LaAlO3 (LSNO/LAO) stack. (1 0 0) oriented CCTO films have been formed through both deposition routes and film complete structural and morphological characterizations have been carried out using several techniques (X-ray diffraction, scanning electron microscopy, energy-filtered transmission electron microscopy). The comparative study demonstrated some differences at the CCTO/LSNO interfaces depending on the adopted deposition technique. Chemical/structural modification of the LSNO electrode probably occurred as a function of the different oxygen partial pressure used in the PLD and MOCVD processes. (literal)
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